Influence of Working Pressure on Ion Sensitive Probe Measurement in Microwave ECR Plasmas
In order to precisely measure the ion parameters in a microwave electron cyclotron resonance plasma using an ion sensitive probe,the dependences of the current-voltage（I-V）characteristics on the shielding height（h）and the potential difference between inner and outer electrodes（V_B）have been investig...
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| Published in | Plasma science & technology Vol. 17; no. 4; pp. 294 - 297 |
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| Main Author | |
| Format | Journal Article |
| Language | English |
| Published |
01.04.2015
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| Subjects | |
| Online Access | Get full text |
| ISSN | 1009-0630 |
| DOI | 10.1088/1009-0630/17/4/06 |
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| Abstract | In order to precisely measure the ion parameters in a microwave electron cyclotron resonance plasma using an ion sensitive probe,the dependences of the current-voltage（I-V）characteristics on the shielding height（h）and the potential difference between inner and outer electrodes（V_B）have been investigated at different working pressures of 0.03 Pa and 0.8 Pa.Results show that the I-V curves at higher pressure are more sensitive to the variation of h than those at lower pressure.The influence of V_B on ion temperature（T_i）measurement becomes more prominent when the pressure is increased from 0.03 Pa to 0.8 Pa.Under both pressures,the optimized h is obtained at the condition where the current reaches zero in the positive voltage region with a suitable V_B of-1.5 V because of effective shielding of the electron E×B drift. |
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| AbstractList | In order to precisely measure the ion parameters in a microwave electron cyclotron resonance plasma using an ion sensitive probe,the dependences of the current-voltage（I-V）characteristics on the shielding height（h）and the potential difference between inner and outer electrodes（V_B）have been investigated at different working pressures of 0.03 Pa and 0.8 Pa.Results show that the I-V curves at higher pressure are more sensitive to the variation of h than those at lower pressure.The influence of V_B on ion temperature（T_i）measurement becomes more prominent when the pressure is increased from 0.03 Pa to 0.8 Pa.Under both pressures,the optimized h is obtained at the condition where the current reaches zero in the positive voltage region with a suitable V_B of-1.5 V because of effective shielding of the electron E×B drift. In order to precisely measure the ion parameters in a microwave electron cyclotron resonance plasma using an ion sensitive probe, the dependences of the current-voltage (I-V) characteristics on the shielding height (h) and the potential difference between inner and outer electrodes (V sub(B)) have been investigated at different working pressures of 0.03 Pa and 0.8 Pa. Results show that the I-V curves at higher pressure are more sensitive to the variation of h than those at lower pressure. The influence of V sub(B) on ion temperature (T sub(i)) measurement becomes more prominent when the pressure is increased from 0.03 Pa to 0.8 Pa. Under both pressures, the optimized h is obtained at the condition where the current reaches zero in the positive voltage region with a suitable V sub(B) of -1.5 V because of effective shielding of the electron EB drift. |
| Author | 马志斌 吴俊 谭必松 沈武林 潘鑫 汪建华 |
| AuthorAffiliation | Province Key Laboratory of Plasma Chemistry and Advanced Materials,School of Materials Science and Engineering, Wuhan Institute of Technology, Wuhan 430073,China |
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| Cites_doi | 10.1063/1.1138683 10.1143/JJAP.44.4128 10.1063/1.1789622 10.1016/j.jnucmat.2004.10.155 10.1088/1009-0630/13/1/14 10.1002/1521-3986(200109)41:5<488::AID-CTPP488>3.0.CO;2-L 10.1016/0167-5087(83)90245-4 10.1002/ctpp.19960360112 10.1063/1.1787581 10.1088/0963-0252/9/3/320 10.1088/0022-3727/17/11/011 10.1016/S0022-3115(02)01364-8 10.1002/ctpp.200410101 10.1063/1.1142203 10.1023/A:1014803711271 |
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| Notes | working pressure ion sensitive probe ion temperature plasma 34-1187/TL In order to precisely measure the ion parameters in a microwave electron cyclotron resonance plasma using an ion sensitive probe,the dependences of the current-voltage（I-V）characteristics on the shielding height（h）and the potential difference between inner and outer electrodes（V_B）have been investigated at different working pressures of 0.03 Pa and 0.8 Pa.Results show that the I-V curves at higher pressure are more sensitive to the variation of h than those at lower pressure.The influence of V_B on ion temperature（T_i）measurement becomes more prominent when the pressure is increased from 0.03 Pa to 0.8 Pa.Under both pressures,the optimized h is obtained at the condition where the current reaches zero in the positive voltage region with a suitable V_B of-1.5 V because of effective shielding of the electron E×B drift. ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
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| References | 11 12 13 15 Glenn J (4) 2000; 9 Matthews G F. (1) 1984; 17 2 3 5 Tan B S (14) 2011; 13 6 8 Tsushima A (7) 2005; 44 9 10 |
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| Snippet | In order to precisely measure the ion parameters in a microwave electron cyclotron resonance plasma using an ion sensitive probe,the dependences of the... In order to precisely measure the ion parameters in a microwave electron cyclotron resonance plasma using an ion sensitive probe, the dependences of the... |
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| SubjectTerms | Drift ECR Electric potential Electrodes Electron cyclotron resonance Microwaves Plasmas Shielding Voltage 微波 探针 灵敏 电子回旋共振等离子体 离子敏感 等离子体压力 精确测量 |
| Title | Influence of Working Pressure on Ion Sensitive Probe Measurement in Microwave ECR Plasmas |
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