CVD growth and properties of phoslon dielectric films

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Bibliographic Details
Published inJournal of the Electrochemical Society Vol. 133; no. 2; pp. 366 - 372
Main Authors LI, P. C, HSIA, L. C
Format Journal Article
LanguageEnglish
Published Pennington, NJ Electrochemical Society 01.02.1986
Subjects
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Characterization
Ternary system
Dielectric materials
Preparation
Chemical composition
Amorphous state
Infrared spectrum
Experimental study
Chemical vapor deposition
Inorganic compound
Thin film
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2108581