A negative, deep-UV resist for 248 nm lithography

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Bibliographic Details
Published inJournal of the Electrochemical Society Vol. 135; no. 4; pp. 1026 - 1027
Main Authors O'TOOLE, M. M, DE GRANDPRE, M. P, FEELY, W. E
Format Journal Article
LanguageEnglish
Published Pennington, NJ Electrochemical Society 01.04.1988
Subjects
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Resist
Photolithography
Negative resist
Vacuum ultraviolet radiation
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ISSN:0013-4651
1945-7111
DOI:10.1149/1.2095763