Metal vapour source with real-time sub-monolayer control

To achieve highly accurate controlled depositions a specially designed vapour source, for metals with low to medium melting temperature, was developed. A quartz crystal microbalance is fitted inside the evaporation chamber to provide real-time rate and thickness monitoring. A carefully planned geome...

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Bibliographic Details
Published inVacuum Vol. 81; no. 11; pp. 1529 - 1531
Main Authors Marques, H.P., Canário, A.R., Teodoro, O.M.N.D., Moutinho, A.M.C.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 28.08.2007
Subjects
Growth
Metal deposition
Vapour source
Growth
Vapour source
Metal deposition
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Summary:To achieve highly accurate controlled depositions a specially designed vapour source, for metals with low to medium melting temperature, was developed. A quartz crystal microbalance is fitted inside the evaporation chamber to provide real-time rate and thickness monitoring. A carefully planned geometry allows maintaining a small deposition area centred on the sample without compromising flow rate measurements. Dosing rates as low as 0.02 ML/min are easily achieved, therefore providing true sub-monolayer control. This source was tested and calibrated for Ag and is being successfully used to study the growth of Ag clusters on TiO 2.
ISSN:0042-207X
1879-2715
DOI:10.1016/j.vacuum.2007.04.029