Control of producing sumicron X-ray masks

A depth control method in etching metal films for X-ray lithography masks is developed and experimentally confirmed. Possibilities of real-time end-point detection and applicability of this technique for automatic process control are demonstrated.

Saved in:
Bibliographic Details
Published inNuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment Vol. 405; no. 2; pp. 514 - 518
Main Authors Greenfield, D.E., Korsakov, V.S., Mishachov, V.I., Trutnev, N.F.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 11.03.1998
Online AccessGet full text

Cover

More Information
Summary:A depth control method in etching metal films for X-ray lithography masks is developed and experimentally confirmed. Possibilities of real-time end-point detection and applicability of this technique for automatic process control are demonstrated.
ISSN:0168-9002
1872-9576
DOI:10.1016/S0168-9002(97)00181-2