Reset-Voltage Controlled Resistance-State and Applications of Forming-Free Fe-Doped SrTiO3 Thin-Film Memristor

In this study, we prepared a strontium ferrite titanate (STF) thin film using a sol–gel process to insulate resistive random-access memory (RRAM) applications. Compared to the typical strontium titanate (STO) RRAM, the improvement in the resistive switching characteristics in STF RRAM is obvious. Th...

Full description

Saved in:
Bibliographic Details
Published inMaterials Vol. 17; no. 20; p. 5021
Main Authors Lee, Ke-Jing, Wu, Cheng-Hua, Lee, Cheng-Jung, Chou, Dei-Wei, Wang, Na-Fu, Wang, Yeong-Her
Format Journal Article
LanguageEnglish
Published Basel MDPI AG 14.10.2024
MDPI
Subjects
Online AccessGet full text

Cover

Loading…
Abstract In this study, we prepared a strontium ferrite titanate (STF) thin film using a sol–gel process to insulate resistive random-access memory (RRAM) applications. Compared to the typical strontium titanate (STO) RRAM, the improvement in the resistive switching characteristics in STF RRAM is obvious. The Al/STO/ITO/Glass RRAM set/reset voltages of −1.4 V/+3.3 V and the Al/STF/ITO/Glass RRAM set/reset voltages of −0.45 V/+1.55 V presented a memory window larger than 103, a low operating voltage and device stability of more than 104 s. In this study, the influence of Fe on the conducting paths and the bipolar resistive switching properties of Al/STF/ITO/Glass RRAM devices is investigated.
AbstractList In this study, we prepared a strontium ferrite titanate (STF) thin film using a sol–gel process to insulate resistive random-access memory (RRAM) applications. Compared to the typical strontium titanate (STO) RRAM, the improvement in the resistive switching characteristics in STF RRAM is obvious. The Al/STO/ITO/Glass RRAM set/reset voltages of −1.4 V/+3.3 V and the Al/STF/ITO/Glass RRAM set/reset voltages of −0.45 V/+1.55 V presented a memory window larger than 10 3 , a low operating voltage and device stability of more than 104 s. In this study, the influence of Fe on the conducting paths and the bipolar resistive switching properties of Al/STF/ITO/Glass RRAM devices is investigated.
In this study, we prepared a strontium ferrite titanate (STF) thin film using a sol-gel process to insulate resistive random-access memory (RRAM) applications. Compared to the typical strontium titanate (STO) RRAM, the improvement in the resistive switching characteristics in STF RRAM is obvious. The Al/STO/ITO/Glass RRAM set/reset voltages of -1.4 V/+3.3 V and the Al/STF/ITO/Glass RRAM set/reset voltages of -0.45 V/+1.55 V presented a memory window larger than 103, a low operating voltage and device stability of more than 104 s. In this study, the influence of Fe on the conducting paths and the bipolar resistive switching properties of Al/STF/ITO/Glass RRAM devices is investigated.In this study, we prepared a strontium ferrite titanate (STF) thin film using a sol-gel process to insulate resistive random-access memory (RRAM) applications. Compared to the typical strontium titanate (STO) RRAM, the improvement in the resistive switching characteristics in STF RRAM is obvious. The Al/STO/ITO/Glass RRAM set/reset voltages of -1.4 V/+3.3 V and the Al/STF/ITO/Glass RRAM set/reset voltages of -0.45 V/+1.55 V presented a memory window larger than 103, a low operating voltage and device stability of more than 104 s. In this study, the influence of Fe on the conducting paths and the bipolar resistive switching properties of Al/STF/ITO/Glass RRAM devices is investigated.
In this study, we prepared a strontium ferrite titanate (STF) thin film using a sol–gel process to insulate resistive random-access memory (RRAM) applications. Compared to the typical strontium titanate (STO) RRAM, the improvement in the resistive switching characteristics in STF RRAM is obvious. The Al/STO/ITO/Glass RRAM set/reset voltages of −1.4 V/+3.3 V and the Al/STF/ITO/Glass RRAM set/reset voltages of −0.45 V/+1.55 V presented a memory window larger than 103, a low operating voltage and device stability of more than 104 s. In this study, the influence of Fe on the conducting paths and the bipolar resistive switching properties of Al/STF/ITO/Glass RRAM devices is investigated.
Author Chou, Dei-Wei
Wang, Na-Fu
Wang, Yeong-Her
Wu, Cheng-Hua
Lee, Cheng-Jung
Lee, Ke-Jing
AuthorAffiliation 2 Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, Tainan 701401, Taiwan; q16091128@gs.ncku.edu.tw (C.-H.W.); 11201043@ncku.edu.tw (C.-J.L.)
1 Center for Environmental Toxin and Emerging-Contaminant Research & Technology Center, Department of Electronic Engineering, Cheng Shiu University, Kaohsiung City 83347, Taiwan; 2227@gcloud.csu.edu.tw (D.-W.C.); k0481@gcloud.csu.edu.tw (N.-F.W.)
AuthorAffiliation_xml – name: 1 Center for Environmental Toxin and Emerging-Contaminant Research & Technology Center, Department of Electronic Engineering, Cheng Shiu University, Kaohsiung City 83347, Taiwan; 2227@gcloud.csu.edu.tw (D.-W.C.); k0481@gcloud.csu.edu.tw (N.-F.W.)
– name: 2 Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, Tainan 701401, Taiwan; q16091128@gs.ncku.edu.tw (C.-H.W.); 11201043@ncku.edu.tw (C.-J.L.)
Author_xml – sequence: 1
  givenname: Ke-Jing
  orcidid: 0000-0001-6607-5759
  surname: Lee
  fullname: Lee, Ke-Jing
– sequence: 2
  givenname: Cheng-Hua
  surname: Wu
  fullname: Wu, Cheng-Hua
– sequence: 3
  givenname: Cheng-Jung
  surname: Lee
  fullname: Lee, Cheng-Jung
– sequence: 4
  givenname: Dei-Wei
  surname: Chou
  fullname: Chou, Dei-Wei
– sequence: 5
  givenname: Na-Fu
  surname: Wang
  fullname: Wang, Na-Fu
– sequence: 6
  givenname: Yeong-Her
  orcidid: 0000-0003-3796-923X
  surname: Wang
  fullname: Wang, Yeong-Her
BookMark eNpdkt9rFDEQgINUbK198S9Y8EWE1cnP3TxJubpaqBTs6WvIZifXHLvJmewJ_vfueUWteZkw883HMMxzchJTREJeUnjLuYZ3k6UNAwmMPiFnVGtVUy3EyT__U3JRyhaWxzltmX5GTrkWUjdMnZH4BQvO9bc0znaD1SrFOadxxKFaCqHMNjqs72Y7Y2XjUF3udmNwdg4plir5qkt5CnFTdxmx6rC-Srul9S6vwy2v1vch1l0Yp-ozTnmRpfyCPPV2LHjxEM_J1-7DevWpvrn9eL26vKkdk4LWTIOVnstGSC4U5dh63-qB9QO0wnnRNFIOVLQMWO8G6L2VjVSyB7DaKcX5Obk-eodkt2aXw2TzT5NsML8TKW-MzXNwIxrfchSsGRAsiF7zHiU4r6SCRrrWHVzvj67dvp9wcLisyI6PpI8rMdybTfphKJWgBajF8PrBkNP3PZbZTKE4HEcbMe2L4ZRRUEwzWNBX_6HbtM9x2dWBgoYyDmyh3hwpl1MpGf2faSiYw1mYv2fBfwHQOqiZ
Cites_doi 10.1016/j.solmat.2007.03.034
10.3390/gels8010020
10.1007/s40145-021-0483-0
10.1109/JEDS.2024.3416516
10.1088/1361-6633/aa892d
10.1186/1556-276X-8-483
10.1016/j.mtcomm.2023.105593
10.1063/5.0021626
10.1109/TED.2016.2637925
10.1155/2014/578168
10.1063/1.2437668
10.1038/ncomms7097
10.1007/s10832-017-0081-2
10.1016/j.apsusc.2007.09.063
10.1016/j.cap.2024.02.008
10.1016/S0925-4005(99)00218-X
10.3390/electronics9061029
10.1016/j.jpcs.2020.109901
10.1016/S0169-4332(97)00389-9
10.1063/1.3699315
10.1109/JPROC.2012.2190369
10.1002/smll.202107575
10.1016/j.electacta.2018.04.087
10.1002/adfm.201501019
10.1002/adma.201001872
10.1038/s41928-018-0092-2
10.1002/smll.202205306
10.1002/adfm.202213874
10.1039/D1TC04201G
10.1016/j.ceramint.2016.04.071
10.1063/1.2931087
ContentType Journal Article
Copyright 2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.
2024 by the authors. 2024
Copyright_xml – notice: 2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.
– notice: 2024 by the authors. 2024
DBID AAYXX
CITATION
7SR
8FD
8FE
8FG
ABJCF
ABUWG
AFKRA
AZQEC
BENPR
BGLVJ
CCPQU
D1I
DWQXO
HCIFZ
JG9
KB.
PDBOC
PIMPY
PQEST
PQQKQ
PQUKI
7X8
5PM
DOA
DOI 10.3390/ma17205021
DatabaseName CrossRef
Engineered Materials Abstracts
Technology Research Database
ProQuest SciTech Collection
ProQuest Technology Collection
Materials Science & Engineering Collection
ProQuest Central (Alumni)
ProQuest Central UK/Ireland
ProQuest Central Essentials
ProQuest Central
Technology Collection
ProQuest One Community College
ProQuest Materials Science Collection
ProQuest Central Korea
SciTech Premium Collection
Materials Research Database
Materials Science Database
Materials Science Collection
Publicly Available Content Database
ProQuest One Academic Eastern Edition (DO NOT USE)
ProQuest One Academic
ProQuest One Academic UKI Edition
MEDLINE - Academic
PubMed Central (Full Participant titles)
Directory of Open Access Journals
DatabaseTitle CrossRef
Publicly Available Content Database
ProQuest Materials Science Collection
Materials Research Database
Technology Collection
Technology Research Database
ProQuest Central Essentials
ProQuest One Academic Eastern Edition
Materials Science Collection
ProQuest Central (Alumni Edition)
SciTech Premium Collection
ProQuest One Community College
ProQuest Technology Collection
ProQuest SciTech Collection
ProQuest Central
Engineered Materials Abstracts
ProQuest One Academic UKI Edition
ProQuest Central Korea
Materials Science & Engineering Collection
Materials Science Database
ProQuest One Academic
MEDLINE - Academic
DatabaseTitleList
MEDLINE - Academic
CrossRef
Publicly Available Content Database

Database_xml – sequence: 1
  dbid: DOA
  name: DOAJ Directory of Open Access Journals
  url: https://www.doaj.org/
  sourceTypes: Open Website
– sequence: 2
  dbid: 8FG
  name: ProQuest Technology Collection
  url: https://search.proquest.com/technologycollection1
  sourceTypes: Aggregation Database
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
EISSN 1996-1944
ExternalDocumentID oai_doaj_org_article_f83e427de0a04b93be50cf656075c8c3
10_3390_ma17205021
GrantInformation_xml – fundername: National Science Council of Taiwan
  grantid: MOST 108-2221-E-006-040-MY3; NSTC-112-2221-E-006-191
GroupedDBID 29M
2WC
2XV
53G
5GY
5VS
8FE
8FG
AADQD
AAFWJ
AAHBH
AAYXX
ABDBF
ABJCF
ADBBV
AENEX
AFKRA
AFPKN
AFZYC
ALMA_UNASSIGNED_HOLDINGS
AOIJS
BCNDV
BENPR
BGLVJ
CCPQU
CITATION
CZ9
D1I
E3Z
EBS
ESX
FRP
GROUPED_DOAJ
GX1
HCIFZ
HH5
HYE
I-F
IAO
ITC
KB.
KC.
KQ8
MK~
MODMG
M~E
OK1
P2P
PDBOC
PGMZT
PIMPY
PROAC
RIG
RPM
TR2
TUS
7SR
8FD
ABUWG
AZQEC
DWQXO
JG9
PQEST
PQQKQ
PQUKI
7X8
5PM
ID FETCH-LOGICAL-c2541-290a5f3574534613e8ff89d2bd084cf47755d148202bcd0bfa57565b00a9c6633
IEDL.DBID RPM
ISSN 1996-1944
IngestDate Mon Oct 28 19:37:41 EDT 2024
Mon Oct 28 05:43:02 EDT 2024
Mon Oct 28 16:45:23 EDT 2024
Sat Oct 26 04:01:15 EDT 2024
Wed Oct 23 14:22:56 EDT 2024
IsDoiOpenAccess true
IsOpenAccess true
IsPeerReviewed true
IsScholarly true
Issue 20
Language English
License Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-c2541-290a5f3574534613e8ff89d2bd084cf47755d148202bcd0bfa57565b00a9c6633
Notes ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ORCID 0000-0003-3796-923X
0000-0001-6607-5759
OpenAccessLink https://www.ncbi.nlm.nih.gov/pmc/articles/PMC11509406/
PMID 39459726
PQID 3120712302
PQPubID 2032366
ParticipantIDs doaj_primary_oai_doaj_org_article_f83e427de0a04b93be50cf656075c8c3
pubmedcentral_primary_oai_pubmedcentral_nih_gov_11509406
proquest_miscellaneous_3121062920
proquest_journals_3120712302
crossref_primary_10_3390_ma17205021
PublicationCentury 2000
PublicationDate 20241014
PublicationDateYYYYMMDD 2024-10-14
PublicationDate_xml – month: 10
  year: 2024
  text: 20241014
  day: 14
PublicationDecade 2020
PublicationPlace Basel
PublicationPlace_xml – name: Basel
PublicationTitle Materials
PublicationYear 2024
Publisher MDPI AG
MDPI
Publisher_xml – name: MDPI AG
– name: MDPI
References Zayim (ref_21) 2008; 92
Banerjee (ref_3) 2022; 18
Lee (ref_9) 2017; 64
Jung (ref_24) 2007; 90
Ginnaram (ref_8) 2021; 151
Li (ref_19) 2021; 10
ref_10
Nili (ref_27) 2015; 25
Ge (ref_11) 2023; 35
Wong (ref_31) 2012; 100
Liu (ref_22) 2016; 42
Huang (ref_29) 2013; 8
Ielmini (ref_16) 2018; 1
Kubicek (ref_17) 2017; 39
Mueller (ref_26) 2015; 6
Lenser (ref_18) 2012; 111
Yamashita (ref_30) 2008; 254
Lee (ref_1) 2024; 61
Gao (ref_13) 2021; 9
Lupo (ref_2) 2024; 12
Menesklou (ref_20) 1999; 59
Lai (ref_28) 1998; 125
Muenstermann (ref_15) 2010; 22
Zaffora (ref_5) 2018; 274
Son (ref_23) 2008; 92
Tang (ref_14) 2023; 33
Chiu (ref_25) 2014; 2014
Lo (ref_7) 2022; 18
Pai (ref_12) 2018; 81
ref_4
Kim (ref_6) 2020; 117
References_xml – volume: 92
  start-page: 164
  year: 2008
  ident: ref_21
  article-title: Sol–gel deposited nickel oxide films for electrochromic applications
  publication-title: Sol. Energy Mater. Sol. Cells
  doi: 10.1016/j.solmat.2007.03.034
  contributor:
    fullname: Zayim
– ident: ref_10
  doi: 10.3390/gels8010020
– volume: 10
  start-page: 1001
  year: 2021
  ident: ref_19
  article-title: Resistive switching and optical properties of strontium ferrate titanate thin film prepared via chemical solution deposition
  publication-title: J. Adv. Ceram.
  doi: 10.1007/s40145-021-0483-0
  contributor:
    fullname: Li
– volume: 12
  start-page: 508
  year: 2024
  ident: ref_2
  article-title: HfO2 Thin Films by Chemical Beam Vapor Deposition for Large Resistive Switching Memristor
  publication-title: IEEE J. Electron Devices Soc.
  doi: 10.1109/JEDS.2024.3416516
  contributor:
    fullname: Lupo
– volume: 81
  start-page: 036503
  year: 2018
  ident: ref_12
  article-title: Physics of SrTiO3-based heterostructures and nanostructures: A review
  publication-title: Rep. Prog. Phys.
  doi: 10.1088/1361-6633/aa892d
  contributor:
    fullname: Pai
– volume: 8
  start-page: 483
  year: 2013
  ident: ref_29
  article-title: Stability scheme of ZnO-thin film resistive switching memory: Influence of defects by controllable oxygen pressure ratio
  publication-title: Nanoscale Res. Lett.
  doi: 10.1186/1556-276X-8-483
  contributor:
    fullname: Huang
– volume: 35
  start-page: 105593
  year: 2023
  ident: ref_11
  article-title: Investigation of resistive switching properties in acceptor-induced Sr(Fe,Ti)O3 thin film memristor
  publication-title: Mater. Today Commun.
  doi: 10.1016/j.mtcomm.2023.105593
  contributor:
    fullname: Ge
– volume: 117
  start-page: 152103
  year: 2020
  ident: ref_6
  article-title: Reset-voltage-dependent precise tuning operation of TiOx/Al2O3 memristive crossbar array
  publication-title: Appl. Phys. Letters.
  doi: 10.1063/5.0021626
  contributor:
    fullname: Kim
– volume: 64
  start-page: 2001
  year: 2017
  ident: ref_9
  article-title: Effects of Ni in strontium titanate nickelate thin films for flexible nonvolatile memory applications
  publication-title: IEEE Trans. Electron Devices
  doi: 10.1109/TED.2016.2637925
  contributor:
    fullname: Lee
– volume: 2014
  start-page: 78168
  year: 2014
  ident: ref_25
  article-title: A review on conduction mechanisms in dielectric films
  publication-title: Adv. Mater. Sci. Eng.
  doi: 10.1155/2014/578168
  contributor:
    fullname: Chiu
– volume: 90
  start-page: 052104
  year: 2007
  ident: ref_24
  article-title: Temperature dependence of high- and low-resistance bistable states in polycrystalline NiO films
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.2437668
  contributor:
    fullname: Jung
– volume: 6
  start-page: 6097
  year: 2015
  ident: ref_26
  article-title: Redox activity of surface oxygen anions in oxygen-deficient perovskite oxides during electrochemical reactions
  publication-title: Nat. Commun.
  doi: 10.1038/ncomms7097
  contributor:
    fullname: Mueller
– volume: 39
  start-page: 197
  year: 2017
  ident: ref_17
  article-title: Resistive states in strontium titanate thin films: Bias effects and mechanisms at high and low temperature
  publication-title: J. Electroceramics
  doi: 10.1007/s10832-017-0081-2
  contributor:
    fullname: Kubicek
– volume: 254
  start-page: 2441
  year: 2008
  ident: ref_30
  article-title: Analysis of XPS spectra of Fe2+ and Fe3+ ions in oxide materials
  publication-title: Appl. Surf. Sci.
  doi: 10.1016/j.apsusc.2007.09.063
  contributor:
    fullname: Yamashita
– volume: 61
  start-page: 75
  year: 2024
  ident: ref_1
  article-title: Highly reliable bipolar resistive switching of tantalum oxide-based memory using Al2O3 diffusion barrier layers
  publication-title: Curr. Appl. Phys.
  doi: 10.1016/j.cap.2024.02.008
  contributor:
    fullname: Lee
– volume: 59
  start-page: 184
  year: 1999
  ident: ref_20
  article-title: High temperature oxygen sensors based on doped SrTiO3
  publication-title: Sens. Actuators B Chem.
  doi: 10.1016/S0925-4005(99)00218-X
  contributor:
    fullname: Menesklou
– ident: ref_4
  doi: 10.3390/electronics9061029
– volume: 151
  start-page: 109901
  year: 2021
  ident: ref_8
  article-title: Memristive and artificial synapse performance by using TiOx/Al2O3 interface engineering in MoS2-based metallic filament memory
  publication-title: J. Phys. Chem. Solids
  doi: 10.1016/j.jpcs.2020.109901
  contributor:
    fullname: Ginnaram
– volume: 125
  start-page: 51
  year: 1998
  ident: ref_28
  article-title: Nucleation and growth of highly oriented lead titanate thin films prepared by a sol-gel method
  publication-title: Appl. Surf. Sci.
  doi: 10.1016/S0169-4332(97)00389-9
  contributor:
    fullname: Lai
– volume: 111
  start-page: 76
  year: 2012
  ident: ref_18
  article-title: Probing the oxygen vacancy distribution in resistive switching Fe-SrTiO3 metal-insulator-metal-structures by micro-x ray absorption near-edge structure
  publication-title: J. Appl. Phys.
  doi: 10.1063/1.3699315
  contributor:
    fullname: Lenser
– volume: 100
  start-page: 1951
  year: 2012
  ident: ref_31
  article-title: Metal-oxide RRAM
  publication-title: Proc. IEEE
  doi: 10.1109/JPROC.2012.2190369
  contributor:
    fullname: Wong
– volume: 18
  start-page: 2107575
  year: 2022
  ident: ref_3
  article-title: Hafnium oxide (HfO2)—A multifunctional oxide: A review on the prospect and challenges of hafnium oxide in resistive switching and ferroelectric memories
  publication-title: Small
  doi: 10.1002/smll.202107575
  contributor:
    fullname: Banerjee
– volume: 274
  start-page: 103
  year: 2018
  ident: ref_5
  article-title: Electrochemically prepared oxides for resistive switching devices
  publication-title: Electrochim. Acta
  doi: 10.1016/j.electacta.2018.04.087
  contributor:
    fullname: Zaffora
– volume: 25
  start-page: 3172
  year: 2015
  ident: ref_27
  article-title: Donor-induced performance tuning of amorphous SrTiO3 memristive nanodevices: Multistate resistive switching and mechanical tunability
  publication-title: Adv. Funct. Mater.
  doi: 10.1002/adfm.201501019
  contributor:
    fullname: Nili
– volume: 22
  start-page: 4819
  year: 2010
  ident: ref_15
  article-title: Coexistence of filamentary and homogeneous resistive switching in Fe-doped SrTiO3 thin-film memristive devices
  publication-title: Adv. Mater.
  doi: 10.1002/adma.201001872
  contributor:
    fullname: Muenstermann
– volume: 1
  start-page: 333
  year: 2018
  ident: ref_16
  article-title: In-memory computing with resistive switching devices
  publication-title: Nat. Electron.
  doi: 10.1038/s41928-018-0092-2
  contributor:
    fullname: Ielmini
– volume: 18
  start-page: 2205306
  year: 2022
  ident: ref_7
  article-title: Revealing Resistive Switching Mechanism in CaFeOx Perovskite System with Electroforming-Free and Reset Voltage-Controlled Multilevel Resistance Characteristics
  publication-title: Small
  doi: 10.1002/smll.202205306
  contributor:
    fullname: Lo
– volume: 33
  start-page: 2213874
  year: 2023
  ident: ref_14
  article-title: High-throughput screening thickness-dependent resistive switching in SrTiO3 thin films for robust electronic synapse
  publication-title: Adv. Funct. Mater.
  doi: 10.1002/adfm.202213874
  contributor:
    fullname: Tang
– volume: 9
  start-page: 16859
  year: 2021
  ident: ref_13
  article-title: Memristor modeling: Challenges in theories, simulations, and device variability
  publication-title: J. Mater. Chem. C
  doi: 10.1039/D1TC04201G
  contributor:
    fullname: Gao
– volume: 42
  start-page: 11411
  year: 2016
  ident: ref_22
  article-title: Sol–gel synthesis of nanoporous NiCo2O4 thin films on ITO glass as high-performance supercapacitor electrodes
  publication-title: Ceram. Int.
  doi: 10.1016/j.ceramint.2016.04.071
  contributor:
    fullname: Liu
– volume: 92
  start-page: 222106
  year: 2008
  ident: ref_23
  article-title: Direct observation of conducting filaments on resistive switching of NiO thin films
  publication-title: Appl. Phys. Lett.
  doi: 10.1063/1.2931087
  contributor:
    fullname: Son
SSID ssj0000331829
Score 2.4340434
Snippet In this study, we prepared a strontium ferrite titanate (STF) thin film using a sol–gel process to insulate resistive random-access memory (RRAM) applications....
In this study, we prepared a strontium ferrite titanate (STF) thin film using a sol-gel process to insulate resistive random-access memory (RRAM) applications....
SourceID doaj
pubmedcentral
proquest
crossref
SourceType Open Website
Open Access Repository
Aggregation Database
StartPage 5021
SubjectTerms Behavior
Crystal structure
Defects
Dielectric properties
Electric potential
Glass substrates
Iron
Microscopy
Morphology
Oxidation
Physical properties
Random access memory
resistive random-access memory
Sol-gel processes
sol–gel
Spectrum analysis
Strontium
strontium ferrite titanate
Strontium titanates
Thin films
Voltage
SummonAdditionalLinks – databaseName: Directory of Open Access Journals
  dbid: DOA
  link: http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwrV07T-QwELYQFRQI7kCEx8noaC0cPxK75BUhJO4KHqKL7NiGlXaT1bL8f8bOAkl1zbWxLTnfeDzfyKNvEDoVCoJwgOxEOW6J8BJcympNSmMkjwEkTzrdd3-Km0dx-yyfB62-Yk1YLw_cA3cWFPeClc5TQ4XV3HpJmxAlY0rZqKbX-aR6kEylO5jDWWW61yPlkNefzQyEaiopy0cRKAn1j9jluDZyEGyqbbS1Yon4vN_dDlrz7Q-0OdAO_InaWDO3JE_ddAlXAr7sS86n3mEYiKQQrEkSlcSmdfh88FCNu4CrLhbBvJBq4T2uPLnq5rD0fvEw-ctxbOZJqsl0hu_8LIkPLHbRY3X9cHlDVs0TSAM5X06YpkYGLksBmEPM9ioEpR2zjirRBFGWUrooAkqZbRy1wQBxKyR4odEN0BC-h9bbrvX7CBdeKAMk3OQ2iMC4No1lhSu8tAEIYpmh35-A1vNeI6OG3CLCXn_DnqGLiPXXjKhrnT6AteuVtet_WTtDR5-WqlfO9lbznAFRglyKZejkaxjcJL59mNZ372kOJL-xNVeG1MjCow2NR9rJaxLcjqxZw8E9-B-_cIg2AHMR418ujtD6cvHuj4HYLO2vdIY_AGyl9m4
  priority: 102
  providerName: Directory of Open Access Journals
– databaseName: ProQuest Technology Collection
  dbid: 8FG
  link: http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1Lb9QwELagXOCAykuEtsgIrlYdPxL7VLWFUCEVDrSot8jPstJusqTb_9-xN7vdXLjGjhLNePx9Y4--QeiLUADCEbIT5bklIkgIKas1qY2RPAFImXW6L39WF9fix428GQ_c7sayys2emDdq37t0Rn7MSwZoCISZnSz_kdQ1Kt2uji00nqJnJavrVNKlmu_bMxbKYcUyvVYl5ZDdHy8MADaVlJUTHMpy_ROOOa2Q3IGcZh-9HLkiPl079xV6ErrX6MWOguAb1KXKuRX5089XsDHg83Xh-Tx4DAOJGoJPSSaU2HQen-5cV-M-4qZPpTC3pBlCwE0gX_slvPp7uJr94ji19CTNbL7Al2GRJQiGt-i6-XZ1fkHGFgrEQeZXEqapkZHLWoDlAbmDilFpz6ynSrgo6lpKn6RAKbPOUxsN0LdKQiwa7YCM8Hdor-u78B7hKghlgIqb0kYRGdfGWVb5KkgbgSbWBfq8MWi7XCtltJBhJLO3j2Yv0Fmy9XZGUrfOD_rhth2DpY2KB8FqH6ihwmpug6QuJpmgWjrleIEON55qx5C7ax8XSIE-bYchWNINiOlCf5_nQAqcGnQVSE08PPmh6Ug3-5tltxN31rB8P_z_6wfoOVhTJHwrxSHaWw334QiIy8p-zKvzAaJf7a4
  priority: 102
  providerName: ProQuest
Title Reset-Voltage Controlled Resistance-State and Applications of Forming-Free Fe-Doped SrTiO3 Thin-Film Memristor
URI https://www.proquest.com/docview/3120712302
https://www.proquest.com/docview/3121062920
https://pubmed.ncbi.nlm.nih.gov/PMC11509406
https://doaj.org/article/f83e427de0a04b93be50cf656075c8c3
Volume 17
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1Nb5wwEB1lU6lKD1U_VdJ05aq9OgvYBnxMtiFRpU2jNqn2hmyw05UWWNHN_8_Yu6Rw7YUDthGaGfu9wcMzwFeeIQhbzE6yimnKjcAppaWkqVKCOQCJvE734jq5uuPfl2J5AEn_L4wv2i_16rRZ16fN6o-vrdzU5ayvE5vdLOaOxUh80GwCE4zQQY7u11-GcRrLnRYpw5x-ViuE6VAgnB3BcyY5kmgnpjAAIq_XPyKZ4xLJAebkr-DlniySs91LvYYD07yBFwMJwbfQuNK5Lf3drre4MpD5rvJ8bSqCDY4bolOpZ5RENRU5G-xXk9aSvHW1MPc074whuaHf2g0O_dXdrn4w4s70pPlqXZOFqb0GQfcO7vKL2_kV3Z-hQEtM_SIay1AJy0TK0fQI3SazNpNVrKsw46XlaSpE5bRAw1iXVaitQv6WCJyMSpbIRth7OGzaxnwAkhieKeTiKtKW25hJVeo4qRIjtEWemAbwpTdosdlJZRSYYjgPFP88EMC5s_VTDydv7W-03X2xd3JhM2Z4nFYmVCHXkmkjwtI6naBUlFnJAjjpPVXs59zfgkUx8iVMqeIAPj8142xxWyCqMe2D74M5sDuhK4Bs5OHRC41bMAy97nYfdsf_P_QjHKGluQO_iJ_A4bZ7MJ-Q1Wz1FCZZfjmFZ-cX1zc_p_7bAF4vl9HUh_cjpEP7kA
link.rule.ids 230,315,730,783,787,867,888,2109,12778,21401,27937,27938,33386,33387,33757,33758,43613,43818,53805,53807,74370,74637
linkProvider National Library of Medicine
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1Lb9QwELZgewAOiKcaKGAEV6uOH4lzQm1ptEB3QbBFvUV-lpV2kyXd_n_G2ex2c-EaO0o04_H3jT36BqGPQgEIB8hOlOOGCC8hpExRkFxrySOApJ1O92SajS_F1yt51R-43fRllds9sduoXWPjGfkxTxmgIRBm9mn1l8SuUfF2tW-hcR8dRKkqNUIHp-fTHz93pyyUw5plxUaXlEN-f7zUANlUUpYOkKgT7B-wzGGN5B7olE_Q454t4pONe5-ie75-hh7taQg-R3WsnVuT381iDVsDPtuUni-8wzAQySF4lXSUEuva4ZO9C2vcBFw2sRjmmpSt97j05HOzgld_tbP5d45jU09SzhdLPPHLToSgfYEuy_PZ2Zj0TRSIhdwvJaygWgYucwG2B-z2KgRVOGYcVcIGkedSuigGSpmxjpqggcBlEqJRFxboCH-JRnVT-0OEMy-UBjKuUxNEYLzQ1rDMZV6aAEQxT9CHrUGr1UYro4IcI5q9ujN7gk6jrXczor5196Bpr6s-XKqguBcsd55qKkzBjZfUhigUlEurLE_Q0dZTVR90N9XdEknQ-90whEu8A9G1b267OZAExxZdCVIDDw9-aDhSz_90wtuRPRewgF_9_-vv0IPxbHJRXXyZfnuNHoJlRUS7VByh0bq99W-AxqzN236t_gPzCvH_
linkToPdf http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1Jb9QwFLaglRA9oLKJtKUYwdUax0sSn1C3qCwdKmhRb5HXMtJMMk2n_5_nTGY6uXCNEyV6i7_vxU_fQ-izKACEA1QnheOGCC8hpYxSJNda8gggaafTfTHOzq_Ftxt50_c_3fdtlas9sduoXWPjP_IRTxmgIRBmNgp9W8TlafllfkfiBKl40tqP03iKtnORcSjEto_Pxpe_1n9cKIf4ZWqpUcqh1h_NNMA3lZSlA1TqxPsHjHPYL7kBQOUuetEzR3y0dPVL9MTXr9DOhp7ga1THProF-dNMF7BN4JNlG_rUOwwLkSiCh0lHL7GuHT7aOLzGTcBlExtjbknZeo9LT06bOTz6u72a_OQ4Dvgk5WQ6wxd-1gkStG_QdXl2dXJO-oEKxEIdmBKmqJaBy1yAHwDHfRFCoRwzjhbCBpHnUrooDEqZsY6aoIHMZRIyUysL1IS_RVt1U_t3CGdeFBqIuU5NEIFxpa1hmcu8NAFIY56gTyuDVvOlbkYF9UY0e_Vo9gQdR1uv74ha192Fpr2t-tSpQsG9YLnzVFNhFDdeUhuiaFAubWF5gg5Wnqr6BLyvHsMlQR_Xy5A68TxE17556O6BgjiO60pQMfDw4IOGK_XkbyfCHZm0gmDe-__bP6BnEKbVj6_j7_voORhWROBLxQHaWrQP_j0wmoU57EP1HyVA9jM
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Reset-Voltage+Controlled+Resistance-State+and+Applications+of+Forming-Free+Fe-Doped+SrTiO3+Thin-Film+Memristor&rft.jtitle=Materials&rft.au=Lee%2C+Ke-Jing&rft.au=Wu%2C+Cheng-Hua&rft.au=Lee%2C+Cheng-Jung&rft.au=Chou%2C+Dei-Wei&rft.date=2024-10-14&rft.pub=MDPI&rft.eissn=1996-1944&rft.volume=17&rft.issue=20&rft_id=info:doi/10.3390%2Fma17205021&rft_id=info%3Apmid%2F39459726&rft.externalDBID=PMC11509406
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=1996-1944&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=1996-1944&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=1996-1944&client=summon