High-power transverse micro-stack weakly coupled laser diode bars
Transverse micro-stack semiconductor laser bars are put forward to improve the output optical power of semiconductor laser bars at low injection current. Micro-stack tunnel regeneration tri-active region laser structure was grown by metal organic chemical vapor deposition (MOCVD) and laser diode bar...
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Published in | Microelectronics Vol. 39; no. 12; pp. 1580 - 1582 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier Ltd
01.12.2008
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Subjects | |
Online Access | Get full text |
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Summary: | Transverse micro-stack semiconductor laser bars are put forward to improve the output optical power of semiconductor laser bars at low injection current. Micro-stack tunnel regeneration tri-active region laser structure was grown by metal organic chemical vapor deposition (MOCVD) and laser diode bars with 50% fill factors were fabricated. Experiments show that the insulated recesses strongly affect the properties of the bars. When the recess depth is less than 1.13μm, the bars do not work well. By optimizing the insulated recess depth, threshold current can be reduced to 7.05A, the optical power exceeds 79W under 50A driving current and the slope efficiency reaches 1.81W/A. |
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ISSN: | 1879-2391 1879-2391 |
DOI: | 10.1016/j.mejo.2008.03.009 |