Thin RF sputtered and thermal Ta2O5 on Si for high density DRAM application
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| Published in | Microelectronics and reliability Vol. 39; no. 8; pp. 1185 - 1217 |
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| Main Author | |
| Format | Journal Article |
| Language | English |
| Published |
01.08.1999
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| Online Access | Get full text |
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| ISSN: | 0026-2714 |
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| DOI: | 10.1016/S0026-2714(99)00038-4 |