Surface modification of silica glass by pulses of a picosecond laser
An experimental laser system for studying the processes of micro– and nanostructure direct formation in a silica glass by picosecond laser pulses is described. A method of ablation monitoring based on the Shack-Hartmann wavefront sensor is proposed. Ablation craters on the surface of the silica glas...
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Published in | Kompʹûternaâ optika Vol. 40; no. 6; pp. 863 - 870 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
2016
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Online Access | Get full text |
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Summary: | An experimental laser system for studying the processes of micro– and nanostructure direct formation in a silica glass by picosecond laser pulses is described. A method of ablation monitoring based on the Shack-Hartmann wavefront sensor is proposed. Ablation craters on the surface of the silica glass varying in depth from 23 ± 4 to 144 ± 18 nm with good edge quality with the power density varying from 0.57 × 1012 to 31 × 1012 W/cm2, respectively, are synthesized. Higher-intensity modes of laser processing lead to the formation of cracks and chips on the surface of the material, with lower-intensity processing leading to the appearance of melting edges. The obtained structures are characterized using an atomic force microscope. The ablation rate of the silica glass is established. |
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ISSN: | 0134-2452 2412-6179 |
DOI: | 10.18287/2412-6179-2016-40-6-863-870 |