Plasma chemical vapor deposition of thin carbon nitride films utilizing transport reactions

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Bibliographic Details
Published inThin solid films Vol. 355-356; pp. 406 - 411
Main Authors Popov, C, Plass, M.F, Kassing, R, Kulisch, W
Format Journal Article
LanguageEnglish
Published 01.11.1999
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ISSN:0040-6090
DOI:10.1016/S0040-6090(99)00457-5