Structural, morphological, optical and electrical properties of Ni-doped SnO2 thin films by pneumatic spray pyrolysis method

In this study, we used a pneumatic spray pyrolysis technique at 450°C to deposit Sn 1– x Ni x O 2 thin films (0.0 ≤  x  ≤ 0.10) on glass substrates. The influence of doping content on the films structural, morphological, optical and electrical properties was investigated. Structural characterization...

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Bibliographic Details
Published inBulletin of materials science Vol. 45; no. 4; p. 227
Main Authors Roguai, Sabrina, Djelloul, Abdelkader
Format Journal Article
LanguageEnglish
Published Bangalore Indian Academy of Sciences 16.11.2022
Springer Nature B.V
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Summary:In this study, we used a pneumatic spray pyrolysis technique at 450°C to deposit Sn 1– x Ni x O 2 thin films (0.0 ≤  x  ≤ 0.10) on glass substrates. The influence of doping content on the films structural, morphological, optical and electrical properties was investigated. Structural characterization by X-ray diffraction indicated that the rutile phase of SnO 2 is present in all thin films, and crystallite sizes are estimated to be in the range of 27–47 nm. Furthermore, structural and microstructural analyses revealed that at x  = 0.05, there is a solubility limit for (Ni/Sn) in the SnO 2 matrix. The optical bandgap energy increases from 3.83 to 4.01 eV as the dopant content increases according to the Burstein-Moss effect. Resistivity is affected by doping and the thickness of thin films. The figure-of-merit calculated for all samples showed significant differences in the Ni–SnO 2 thin films. There was a difference between the doped thin films depending on the thickness. The lowest resistivity of 1.32 × 10 −2  Ω cm and the maximum conductivity of 75 Ω −1 cm −1 was found at a Ni content of 2%. Seebeck coefficient of all the thin films developed had n-type conductivity, and the values of 76, 71, 133 and 69 µ V/K for Ni-doped SnO 2 thin films at 0, 2, 5 and 10 at.%, respectively, were found to improve the thermoelectric properties of SnO 2 by Ni doping.
ISSN:0973-7669
0250-4707
0973-7669
DOI:10.1007/s12034-022-02804-3