Improvement of instrumentation consistency using DUV filter in Spectroscopic Ellipsometry

• Published in: Solid-state electronics Vol. 216; p. 108912
• Main Authors: Gim, Yu-Seong, Jung, Yong-Woo, Yi, Jong-Seok, Lee, Kang-Won
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.06.2024
• ISSN: 0038-1101; 1879-2405
• DOI: 10.1016/j.sse.2024.108912

•The denaturation due to long-term use of WRM is a cause that can reduce the reliability of measurement equipment.•By applying the DUV Filter, it was possible to obtain the effect of preventing the standard denaturation rate by 33%.•Discovered 5 management specifications are expected to strengthen measurement consistency for semiconductor mass production. In the process of mass-production of semiconductors, it has been continuously required to determine whether the process is normal or not, and for this, it must be premised that the measurement equipment can produce reliable and consistent measurement data. However, Due to the denaturation of Working Reference Material (WRM), which is the basis for judging the accuracy and precision of the equipment, it is difficult to maintain the consistency of the instrument. In this study, the effect of preventing WRM denaturation was analyzed through optical path control in Spectroscopic Ellipsometry (SE) equipment. Therefore, by applying it to actual equipment, It is suggested methods to improve measurement equipment reliability.