Multilayer thin film metallic glasses under nanoscratch: Deformation and failure characteristics

•Nanoindentation and scratch tests were performed multilayer thin film metallic glasses (TFMG).•Failure of multilayer TFMG is greatly influenced by modulation ratio and layer pattern.•Thin film with layer pattern (layer 1 /layer 2) = (Zr55 / Zr65) show better tribological performances.•Tribological...

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Bibliographic Details
Published inJournal of non-crystalline solids Vol. 601; p. 122047
Main Authors Marimuthu, Karuppasamy Pandian, Han, Giyeol, Lee, Hyungyil
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.02.2023
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Summary:•Nanoindentation and scratch tests were performed multilayer thin film metallic glasses (TFMG).•Failure of multilayer TFMG is greatly influenced by modulation ratio and layer pattern.•Thin film with layer pattern (layer 1 /layer 2) = (Zr55 / Zr65) show better tribological performances.•Tribological performance of multilayer TFMG system can be controlled by changing layer pattern. A nanoscratch technique to investigate the deformation and failure characteristics of multilayer thin film metallic glasses (TFMGs) is described. Nanoscratch experiments were performed on Zr-based multilayer (bilayer) TFMGs deposited over hard substrates (Si, soda-lime glass). Layer pattern and modulation ratio greatly influence the thin films failures under nanoscratch. When compared with pattern (layer-1 / layer-2) = (Zr65 / Zr55), multilayer TFMGs with layer pattern = (Zr55 / Zr65) shows better tribological performances regardless of substrate type (Si or SLG) under the considered nanoscratch conditions. This study is beneficial to find appropriate combination of layer pattern and modulation ratio to ensure good adhesion between multilayer TFMG and substrate.
ISSN:0022-3093
1873-4812
DOI:10.1016/j.jnoncrysol.2022.122047