Electron beam lithography and ion implantation techniques for fabrication of high-Tc Josephson junctions

Established semiconductor process technologies are demonstrated to be suitable for the fabrication of high temperature superconductor (HTS) Josephson junctions. Single YBCO bridges were modified by local oxygen ion irradiation through a narrow slit in a PMMA mask which was formed by electron beam li...

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Bibliographic Details
Published inMicroelectronic engineering Vol. 30; no. 1-4; pp. 407 - 410
Main Authors Barth, R., Hamidi, A.H., Hadam, B., Hollkott, J., Dunkmann, D., Auge, J., Kurz, H.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 01.01.1996
Elsevier Science
Subjects
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Copper Oxides
Microelectronic fabrication
Ion implantation
Barium Oxides
Quaternary compound
Yttrium Oxides
Josephson junction
Experimental study
High temperature superconductor
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Summary:Established semiconductor process technologies are demonstrated to be suitable for the fabrication of high temperature superconductor (HTS) Josephson junctions. Single YBCO bridges were modified by local oxygen ion irradiation through a narrow slit in a PMMA mask which was formed by electron beam lithography. The influence of slit dimension and irradiation dose was investigated. The critical current and normal resistance ot the modified microbridges can be controlled by these two parameters. Proximity coupling across the modified region is observed up to a slit width of 250 nm. When exposed to microwave irradiation the microbridges exhibited Shapiro steps. In dc SQUIDs a voltage modulation as a function of an applied magnetic flux is observed.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(95)00274-X