Structural and mechanical properties of TaN/a-CNx multilayer films
TaN/a-CNx multilayer films with modulation periods of 8.5-12nm are deposited on Si wafers and titanium alloy substrate using direct current magnetron sputtering. The morphology and structure of the films are characterized by scanning electron microscopy, X-ray diffraction and transmission electron m...
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Published in | Surface & coatings technology Vol. 206; no. 8-9; pp. 2242 - 2248 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier
15.01.2012
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Subjects | |
Online Access | Get full text |
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Summary: | TaN/a-CNx multilayer films with modulation periods of 8.5-12nm are deposited on Si wafers and titanium alloy substrate using direct current magnetron sputtering. The morphology and structure of the films are characterized by scanning electron microscopy, X-ray diffraction and transmission electron microscopy. Mechanical and tribological properties are tested by nanoindention and ball-on-disk tribometer. Columnar structure exists in single TaN film and TaN/a-CNx multilayer with 0.5nm-CNx, while the columnar crystalline can be better interrupted by thicker a-CNx layers. The hardness of all the TaN/a-CNx multilayers is higher than that of the single TaN film. The maximum hardness of 31.0GPa and the friction coefficient of 0.12 are obtained in the multilayer film with 2nm-CNx. According to our research, the thickness of a-CNx in multilayer is best to distribute within 1-2nm. The wear rates under 5N are in the order of 10-15m3m-1N-1for the multilayer films and increased by 1 order of magnitude 10-14for the TaN film (1.610-14m3m-1Na degree 1). |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0257-8972 1879-3347 |
DOI: | 10.1016/j.surfcoat.2011.09.072 |