Ion beam modification of structural and optical properties of GeO2 thin films deposited at various substrate temperatures using pulsed laser deposition

High energy heavy ion irradiation-induced modification of high quality crystalline GeO 2 thin films grown at different substrate temperatures ranging from 100 to 500 °C using pulsed laser deposition has been investigated. The pristine films were irradiated with 100 MeV Ag 7+ ions at fixed fluence of...

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Published inApplied physics. A, Materials science & processing Vol. 123; no. 11; pp. 1 - 10
Main Authors Rathore, Mahendra Singh, Vinod, Arun, Angalakurthi, Rambabu, Pathak, A. P., Singh, Fouran, Thatikonda, Santhosh Kumar, Nelamarri, Srinivasa Rao
Format Journal Article
LanguageEnglish
Published Berlin/Heidelberg Springer Berlin Heidelberg 01.11.2017
Springer Nature B.V
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Summary:High energy heavy ion irradiation-induced modification of high quality crystalline GeO 2 thin films grown at different substrate temperatures ranging from 100 to 500 °C using pulsed laser deposition has been investigated. The pristine films were irradiated with 100 MeV Ag 7+ ions at fixed fluence of 1 × 10 13 ions/cm 2 . These pristine and irradiated films have been characterized using X-ray diffraction, atomic force microscopy, Raman spectroscopy, Fourier transform infrared and photoluminescence spectroscopy. The XRD and Raman results of pristine films confirm the formation of hexagonal structure of GeO 2 films, whereas the irradiation eliminates all the peaks except major GeO 2 peak of (101) plane. It is evident from the XRD results that crystallite size changes with substrate temperature and SHI irradiation. The surface morphology of films was studied by AFM. The functional group of pristine and irradiated films was investigated by IR transmission spectra. Pristine films exhibited strong photoluminescence around 342 and 470 nm due to oxygen defects and a red shift in the PL bands is observed after irradiation. Possible mechanism of tuning structural and optical properties of pristine as well as irradiated GeO 2 films with substrate temperature and ion beam irradiation has been reported in detail.
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-017-1310-x