Measurement of boron and phosphorus concentration in silicon by low-temperature FTIR spectroscopy

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Bibliographic Details
Published inApplied physics. A, Materials science & processing Vol. 81; no. 6; pp. 1187 - 1190
Main Authors Porrini, M., Pretto, M.G., Scala, R., Batunina, A.V., Alt, H.C., Wolf, R.
Format Journal Article
LanguageEnglish
Published 01.11.2005
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ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-004-3032-0