Preparation and structural stability investigation of CoN/CN soft X-ray multilayers

• Published in: Science China. Mathematics Vol. 40; no. 11; pp. 1194 - 1203
• Main Author: 白海力 姜恩永 王存达 田仁玉
• Format: Journal Article
• Language: English
• Published: Heidelberg Springer Nature B.V 01.11.1997
• Subjects: Annealing; Bonding strength; Chemical bonds; Doping; Grain growth; Heat treatment; High temperature; Measurement techniques; Multilayers; Phase transitions; Photoelectrons; Raman spectra; soft; Soft x rays; stability; Structural stability; thermal; Transformation temperature; X-ray
• ISSN: 1674-7283; 1006-9283; 1869-1862; 1862-2763
• DOI: 10.1007/BF02931838

The structural stability of heat-treated CoN/CN soft X-ray multilayers fabricated by dual-facing-target sputtering has been investigated by using complementary measurement techniques.The high temperature annealing results imply that the destructive threshold of the Co/C multilayers is improved by 100-200 degrees centigrade through doping with N.The low-angle X-ray diffraction of CoN/CN soft X-ray multilayers indicates that the period expansion of the multilayers is only 4 % at 400℃,and the interface pattern still exists even if they were annealed at 700℃.The Raman spectra analyses give the evidence that the formation of the sp bonding in the CN sublayers can be suppressed effectively by doping N with atoms,and thus the period expansion resulting from the changes in the density of CN layers can be decreased considerably.The X-ray photoelectron spectra analyses present the information of the existence of the strong covalent bonding between C and N atoms,and the ionic bonding between Co and N atoms,which