Characterization of ZnO―SnO2 thin film composites prepared by pulsed laser deposition
Thin films of ZnO-SnO2 composites have been deposited on Si(100) and glass substrates at 500 degree C by pulsed laser ablation using different composite targets with ZnO amount varying between 1 and 50wt%. The effect of increasing ZnO-content on electrical, optical and structural properties of the Z...
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Published in | Applied surface science Vol. 257; no. 24; pp. 10551 - 10556 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier
01.10.2011
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Subjects | |
Online Access | Get full text |
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Summary: | Thin films of ZnO-SnO2 composites have been deposited on Si(100) and glass substrates at 500 degree C by pulsed laser ablation using different composite targets with ZnO amount varying between 1 and 50wt%. The effect of increasing ZnO-content on electrical, optical and structural properties of the ZnO-SnO2 films has been investigated. X-ray diffraction analysis indicates that the as-deposited ZnO-SnO2 films can be both crystalline (for ZnO<1wt%) and amorphous (for ZnO greater than or equal to 10wt%) in nature. Atomic force microscopy studies of the as-prepared composite films indicate that the surfaces are fairly smooth with rms roughness varying between 3.07 and 2.04nm. The average optical transmittance of the as-deposited films in the visible range (400-800nm), decreases from 90% to 72% for increasing ZnO concentration in the film. The band gap energy (E |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2011.07.049 |