PLD thin films obtained from CrO3 and Cr8O21 targets

• Published in: Applied surface science Vol. 247; no. 1-4; pp. 139 - 144
• Main Authors: GUINNETON, F, MONNEREAU, O, ARGEME, L, STANOI, D, SOCOL, G, MIHAILESCU, I. N, ZHANG, T, GRIGORESCU, C, TRODAHL, H. J, TORTET, L
• Format: Conference Proceeding Journal Article
• Language: English
• Published: Amsterdam Elsevier Science 15.07.2005
• Subjects: Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Laser deposition; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Physics; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology; Atomic force microscopy; Scanning electron microscopy; Raman spectra; AFM; PLD; Pulsed laser deposition; XRD; Raman spectroscopy; Film growth; Surface structure; Thin films; Chromium oxides; SEM
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/j.apsusc.2005.01.073

Thin films of chromium oxides mixtures have been grown on sapphire substrates using pulsed laser deposition (PLD). The work originates from the goal of enhancing the CrO2 concentration in the films deposited from targets made of various chromium oxides. Their stability depends on temperature and pressure conditions. The PLD experiments are reviewed with the aim of discussing the influence of the target composition and of the deposition conditions upon the resulted films. The targets and corresponding thin films have been characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and Raman spectroscopy. The Cr8O21 targets are the most stable, which allows the preparation of thin films with a reproducible CrO2 content of about 25% and a satisfactory surface morphology.