Femtosecond laser plasma in CaF2 crystal microchannel and effective generation of characteristic X-ray radiation

The dependence of the characteristic X-ray radiation yield from CaF 2 crystal on the formed microchannel depth under highly intensive ( I ∼ 3 × 10 15 W/cm 2 ) laser pulses with different contrast was obtained. The maximum of the characteristic X-ray radiation yield at these experimental conditions c...

Full description

Saved in:
Bibliographic Details
Published inSurface investigation, x-ray, synchrotron and neutron techniques Vol. 4; no. 2; pp. 183 - 188
Main Authors Gordienko, V. M., Makarov, I. A., Petukhov, V. P., Khomenko, A. S.
Format Journal Article
LanguageEnglish
Published Dordrecht SP MAIK Nauka/Interperiodica 01.04.2010
Subjects
Chemistry and Materials Science
Materials Science
Surfaces and Interfaces
Thin Films
Neutron Technique
Target Surface
Laser Shot
Surface Investigation
Laser Radiation
Online AccessGet full text

Cover

More Information
Summary:The dependence of the characteristic X-ray radiation yield from CaF 2 crystal on the formed microchannel depth under highly intensive ( I ∼ 3 × 10 15 W/cm 2 ) laser pulses with different contrast was obtained. The maximum of the characteristic X-ray radiation yield at these experimental conditions corresponded to the microchannel depth of 30–50 μm. The efficiency of the laser radiation conversion to the characteristic X-ray radiation increased from 6 × 10 −8 for the surface up to 10 −7 in the microchannel. The dependence of the characteristic X-ray radiation yield on the viewing angle showed that the source of X-ray radiation was located near the surface inside the microchannel.
ISSN:1027-4510
1819-7094
DOI:10.1134/S1027451010020011