High-density accessible Ru-Se-Ni moieties boost the hydrogen evolution reaction by optimizing H absorption
The rising demand for sustainable hydrogen production has led to intensified research into alternative catalysts for the Hydrogen Evolution Reaction (HER). This study focuses on incorporating ruthenium (Ru) into nickel selenide (NiSe 2 ) to boost the electrocatalytic efficiency of the HER. Theoretic...
Saved in:
Published in | Inorganic chemistry frontiers Vol. 11; no. 6; pp. 1733 - 1741 |
---|---|
Main Authors | , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
London
Royal Society of Chemistry
12.03.2024
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The rising demand for sustainable hydrogen production has led to intensified research into alternative catalysts for the Hydrogen Evolution Reaction (HER). This study focuses on incorporating ruthenium (Ru) into nickel selenide (NiSe
2
) to boost the electrocatalytic efficiency of the HER. Theoretical calculations suggest that Ru-Se-Ni moieties can alter the Gibbs free energy of adsorption for water molecules, thereby enhancing electrocatalytic kinetics. The experimental creation of RuNiSe
2
on nickel foam (RuNiSe
2
/NF) leads to a stable 3D structure with significant electrochemical stability. The catalyst exhibits a low overpotential of 36 mV to achieve a current density of 10 mA cm
2
and maintains long-term stability for over 60 hours. Theoretical predictions, corroborated by experimental findings, indicate that introducing a small quantity of Ru refines the electronic structure of NiSe
2
. This makes Ru-doped NiSe
2
a cost-effective and efficient catalyst for the HER in alkaline environments. The study offers important insights into designing catalysts for sustainable hydrogen production
via
water electrolysis.
Ru-doped NiSe
2
enhances HER, achieving 36 mV overpotential and exceptional durability in alkaline electrolytes, showcasing a novel approach to catalyst design. |
---|---|
Bibliography: | https://doi.org/10.1039/d3qi02668j Electronic supplementary information (ESI) available. See DOI |
ISSN: | 2052-1553 2052-1545 2052-1553 |
DOI: | 10.1039/d3qi02668j |