Z-scheme NiFe LDH/Bi4O5I2 heterojunction for photo-Fenton oxidation of tetracycline
Designing an efficient catalyst for photo-Fenton organic contaminant degradation has been an important subject intended to solve the related environmental deterioration and enormous energy crises. However, the rapid cycle of Fe3+/Fe2+ in a wide pH range based on photo-Fenton reaction is still challe...
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Published in | Journal of alloys and compounds Vol. 944; p. 169124 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
25.05.2023
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Subjects | |
Online Access | Get full text |
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Summary: | Designing an efficient catalyst for photo-Fenton organic contaminant degradation has been an important subject intended to solve the related environmental deterioration and enormous energy crises. However, the rapid cycle of Fe3+/Fe2+ in a wide pH range based on photo-Fenton reaction is still challenging. Here, we prepare highly effective and stable Z-scheme NiFe LDH/Bi4O5I2 heterogeneous Fenton catalyst for tetracycline (TC) photodegradation. The optimized NiFe LDH/Bi4O5I2 composite (NFBOI-35) reaches more than 95% TC degradation efficiency in Fenton system under visible light irradiation. Excellent stability, low metal ions leaching concentration and wide pH applicability distinguish make NFBOI-35 be a potential candidate for TC elimination. The improved photo-Fenton performance is mainly attributed to the construction of Z-scheme heterojunction and the accelerated decomposition of H2O2, which realizes the remarkable synergy effect between photocatalysis and Fenton reaction. This work would be beneficial to design Z-scheme catalyst for photo-Fenton organic contaminants degradation and other solar energy application.
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•A novel Z-scheme NiFe LDH/Bi4O5I2 composite was prepared as Fenton photocatalyst.•The optimal composite (NFBOI-35) achieves over 95% tetracycline degradation ability.•Superior photocatalytic activity results from efficient carrier separation.•The NFBOI-35 photo-Fenton system displays broad pH applicability. |
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ISSN: | 0925-8388 1873-4669 |
DOI: | 10.1016/j.jallcom.2023.169124 |