Adsorption of atomic oxygen (N2O) on a clean Si(100) surface and its influence on the surface state density: a comparison with O2

Saved in:
Bibliographic Details
Published inSurface science Vol. 180; no. 2-3; pp. 565 - 598
Main Authors KEIM, E. G, WOLTERBEEK, L, VAN SILFHOUT, A
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier Science 02.02.1987
Amsterdam
New York, NY
Subjects
Chemistry
Exact sciences and technology
General and physical chemistry
Solid-gas interface
Surface physical chemistry
Inorganic adsorbate
Chemisorption
Oxygen
Semiconductor materials
Surface electron state
Crystal face
Inorganic adsorbent
Experimental study
Gas solid adsorption
Gas solid interface
Optical method
Reflectometry
Adsorption structure
LEED diffraction
Silicon
Nitrogen protoxide
Differential method
Auger electron spectrometry
Comparative study
Physical method
Online AccessGet full text

Cover

More Information
ISSN:0039-6028
1879-2758
DOI:10.1016/0039-6028(87)90226-3