Carborane-Based Photoacid Generators: New Superacids For 193nm and EUV Lithography
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Published in | Journal of photopolymer science and technology Vol. 20; no. 5; pp. 627 - 635 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
2007
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Online Access | Get full text |
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ISSN: | 0914-9244 1349-6336 |
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DOI: | 10.2494/photopolymer.20.627 |