Impact of Work-Function Variation in Ferroelectric Field-Effect Transistor
We analyzed the impact of work-function variation (WFV) in ferroelectric field-effect transistor (FeFET). To analyze the operation characteristics, we employed the technology computer-aided design (TCAD) simulations. After evaluating ferroelectricity (FE) characteristics and optimizing device model...
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Published in | IEEE journal of the Electron Devices Society Vol. 12; pp. 779 - 784 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
New York
IEEE
2024
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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Summary: | We analyzed the impact of work-function variation (WFV) in ferroelectric field-effect transistor (FeFET). To analyze the operation characteristics, we employed the technology computer-aided design (TCAD) simulations. After evaluating ferroelectricity (FE) characteristics and optimizing device model parameters through calibration, we extracted five key parameters from the hysteretic transfer curves of the FeFET: threshold voltage (Vth), on current (Iin), subthreshold swing (SS), off current (Ioff), and gate-induced drain leakage (GIDL). The extracted parameters were compared based on the presence or absence of FE and the ferroelectric thickness. It was confirmed that the presence of FE leads to increased variation due to dipole alignment with WFV, and that the electric field is maintained even with an increase in ferroelectric thickness |
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ISSN: | 2168-6734 2168-6734 |
DOI: | 10.1109/JEDS.2024.3465594 |