Interfacial characteristics dependence on interruption times in InGaAs/InAlAs superlattice grown by molecular beam epitaxy

• Published in: Journal of alloys and compounds Vol. 1006; p. 176297
• Main Authors: Lee, Won Jun, Seo, Juwon, Shin, Jae Cheol, Han, Il Ki, Kim, Tae Geun, Kang, JoonHyun
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 25.11.2024
• Subjects: Growth interruption time; InAlAs; InGaAs; Interfacial characteristics; Molecular beam epitaxy; Superlattice; InGaAs; Molecular beam epitaxy; Interfacial characteristics; Growth interruption time; InAlAs; Superlattice
• ISSN: 0925-8388
• DOI: 10.1016/j.jallcom.2024.176297

This study delves into the impact of interruption times on the interfacial characteristics of strain-balanced InGaAs/InAlAs superlattice structures. The structures were grown epitaxially using molecular beam epitaxy technique and subsequently analyzed through atomic probe tomography. Based on our findings, interruption times significantly influence the characteristics of layers and interfaces, as well as the composition of layers. Notably, interruption times significantly influence the interface length in the InAlAs layers, with changes of up to 10 % of its thickness. In contrast, the interface length in the InGaAs layers remains unaffected by variations in interruption time. These insights into the evolution of interface lengths, which are influenced by the growth modes of layers, adatom mobility, and interruption times, present a promising opportunity for enhancing epitaxial growth methods for quantum devices. •Interfacial characteristics dependence of InGaAs/InAlAs superlattice on interruption times investigated.•Interface properties evaluated via HRXRD and atomic probe tomography.•Interface of “InAlAs grown on InGaAs” cases exhibited relatively abrupt interfaces.•Interface of "InGaAs grown on InAlAs" cases exibited longer interfaces.•Changes of atom compositions with layer thickness variation exhibited dependence on interruption times.•Interface lengths show dependence on the interruption times and the thickness of the underlying layer.