Comprehensive Study of Inversion Capacitance in Metal-Insulator-Semiconductor Capacitor with Existing Oxide Charges

The impact of oxide charges on the metal-insulator-semiconductor (MIS) device's capacitance (C) and conductance (G) was studied in this work. A model to calculate MIS device's C and G under the considerations of oxide charges, doping concentration, device dimension, and AC signal frequency...

Full description

Saved in:
Bibliographic Details
Published inIEEE journal of the Electron Devices Society Vol. 10; p. 1
Main Authors Chen, Kung-Chu, Lin, Kuan-Wun, Huang, Sung-Wei, Lin, Jian-Yu, Hwu, Jenn-Gwo
Format Journal Article
LanguageEnglish
Published New York IEEE 2022
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:The impact of oxide charges on the metal-insulator-semiconductor (MIS) device's capacitance (C) and conductance (G) was studied in this work. A model to calculate MIS device's C and G under the considerations of oxide charges, doping concentration, device dimension, and AC signal frequency (ω) was proposed. A relation of C-CD∞ω-0.5 was found, where CD is the depletion capacitance under the electrode. The relation is examined by the experimental and the TCAD simulation. The capacitance of a MIS device with oxide charges can be calculated according to the proposed model and is well-matched with the TCAD simulation under light to moderate doping concentration. For heavily doped substrates, the modeling deviates from the simulation results because of quantum confinement and concentration-dependent mobility. However, the trend of the capacitance value is still able to be estimated by our modeling. From the modeling, it was found that for Qox/q=7.5×1010cm-2, the MIS capacitor with substrate doping concentration NA=1×1015cm-3 exhibits a long lateral AC signal decay length of 52 m at 1 kHz under the inversion region. The findings of this work are fundamental and are helpful for device engineering.
ISSN:2168-6734
2168-6734
DOI:10.1109/JEDS.2022.3215771