Comprehensive Study of Inversion Capacitance in Metal-Insulator-Semiconductor Capacitor with Existing Oxide Charges
The impact of oxide charges on the metal-insulator-semiconductor (MIS) device's capacitance (C) and conductance (G) was studied in this work. A model to calculate MIS device's C and G under the considerations of oxide charges, doping concentration, device dimension, and AC signal frequency...
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Published in | IEEE journal of the Electron Devices Society Vol. 10; p. 1 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
New York
IEEE
2022
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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Summary: | The impact of oxide charges on the metal-insulator-semiconductor (MIS) device's capacitance (C) and conductance (G) was studied in this work. A model to calculate MIS device's C and G under the considerations of oxide charges, doping concentration, device dimension, and AC signal frequency (ω) was proposed. A relation of C-CD∞ω-0.5 was found, where CD is the depletion capacitance under the electrode. The relation is examined by the experimental and the TCAD simulation. The capacitance of a MIS device with oxide charges can be calculated according to the proposed model and is well-matched with the TCAD simulation under light to moderate doping concentration. For heavily doped substrates, the modeling deviates from the simulation results because of quantum confinement and concentration-dependent mobility. However, the trend of the capacitance value is still able to be estimated by our modeling. From the modeling, it was found that for Qox/q=7.5×1010cm-2, the MIS capacitor with substrate doping concentration NA=1×1015cm-3 exhibits a long lateral AC signal decay length of 52 m at 1 kHz under the inversion region. The findings of this work are fundamental and are helpful for device engineering. |
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ISSN: | 2168-6734 2168-6734 |
DOI: | 10.1109/JEDS.2022.3215771 |