Controlling the crystallographic orientation and easy axis of magnetic anisotropy in L10 FePt films with Cu additive

• Published in: Surface & coatings technology Vol. 198; no. 1-3; pp. 270 - 273
• Main Authors: DING, Y. F, CHEN, J. S, LIU, E
• Format: Conference Proceeding Journal Article
• Language: English
• Published: Lausanne Elsevier 01.08.2005
• Subjects: Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Other topics in materials science; Physics; Additives; Crystal orientation; FePt alloy; Platinum; Magnetic anisotropy; Iron; 68.55.Jk; Preferred orientation; 75.50.Ss Co-sputtering; Sputtering
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/j.surfcoat.2004.10.080

By co-sputtering Cu and FePt onto Cr90Mo10 underlayers, the preferred orientation and easy axis of magnetic anisotropy of FePt films were successfully changed from the perpendicular to the in-plane direction. The pure FePt film grown on the Cr < 90Mo10 underlayer showed a (001) preferred orientation with out-of-plane magnetic anisotropy. As 20 and 40 vol.% Cu were doped, the FePt films showed a (200) preferred orientation with in-plane magnetic anisotropy. The pure FePt film showed a continuous microstructure, while the Cu-doped FePt films showed a mixture of particle-like and continuous microstructures. The change of the preferred orientation in the FePt films by Cu doping might be due to the competition of grain-boundary energy, surface free energy and epitaxial-strain energy. The experimental results suggest that the Cu doping be a promising method for the fabrication of the in-plane oriented FePt films. The Cu-doped FePt films had a lower Ms than the pure FePt film.