Investigation of textured aluminum nitride films prepared by chemical vapor deposition

Textured polycrystalline aluminum nitride films are grown on a silica substrate by chemical vapor deposition using metallic aluminum and ammonium chloride as the initial reagents. The good texture and crystal quality of the prepared films are confirmed by raster electron microscopy, Raman spectrosco...

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Bibliographic Details
Published inRussian microelectronics Vol. 46; no. 1; pp. 26 - 29
Main Authors Red’kin, A. N., Ryzhova, M. V., Yakimov, E. E., Roshchupkin, D. V.
Format Journal Article
LanguageEnglish
Published Moscow Pleiades Publishing 2017
Springer Nature B.V
Subjects
Ammonium chloride
Electrical Engineering
Engineering
Raman spectroscopy
Reagents
Silicon dioxide
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Summary:Textured polycrystalline aluminum nitride films are grown on a silica substrate by chemical vapor deposition using metallic aluminum and ammonium chloride as the initial reagents. The good texture and crystal quality of the prepared films are confirmed by raster electron microscopy, Raman spectroscopy, and X-ray diffraction.
ISSN:1063-7397
1608-3415
DOI:10.1134/S1063739717010085