New CVD Precursors Capable of Depositing Copper Metal under Mixed O 2 /Ar Atmosphere
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Published in | Inorganic chemistry Vol. 44; no. 20; pp. 7226 - 7233 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
03.10.2005
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Online Access | Get full text |
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ISSN: | 0020-1669 1520-510X |
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DOI: | 10.1021/ic050845h |