Photocure Behavior of Highly Transparent and Thermally Stable Photosensitive Polymer

A new photosensitive prepolymer was designed and synthesized by esterification of an epoxy and methacrylic acid. Photopolymerization behavior of the prepolymer was quantitatively investigated by FT-IR spectroscopy. We also studied thermal stability by observing changes in the transmittance of the po...

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Published inMolecular crystals and liquid crystals (Philadelphia, Pa. : 2003) Vol. 377; no. 1; pp. 313 - 316
Main Authors Bae, Jung Hwan, Choi, Myoung Soo, Kim, Whan Gun, Kwon, Youngdon, Lee, Jun Young
Format Journal Article
LanguageEnglish
Published Taylor & Francis Group 01.01.2002
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Summary:A new photosensitive prepolymer was designed and synthesized by esterification of an epoxy and methacrylic acid. Photopolymerization behavior of the prepolymer was quantitatively investigated by FT-IR spectroscopy. We also studied thermal stability by observing changes in the transmittance of the polymer film upon heating at 250 °C for a given period of time.
ISSN:1542-1406
1563-5287
DOI:10.1080/713738537