Silicon Nitride Film Removal During Chemical Mechanical Polishing Using Ceria-Based Dispersions

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Bibliographic Details
Published inJournal of the Electrochemical Society Vol. 158; no. 8; p. H763
Main Authors Veera Dandu, P. R., Peethala, B. C., Amanapu, H. P., Babu, S. V.
Format Journal Article
LanguageEnglish
Published 01.01.2011
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ISSN:0013-4651
DOI:10.1149/1.3596181