(Invited) Large Format Atomic Layer Deposition

The demonstrated benefits provided by Atomic Layer Deposition (ALD) in producing films of exceptional uniformity, and conformality, has set the stage for its use in large area, and batch processing applications. Two key elements which drive the adoption of ALD for these applications are the ability...

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Bibliographic Details
Published inECS transactions Vol. 33; no. 2; pp. 429 - 440
Main Authors Sundaram, Ganesh M., Bertuch, Adam, Bhatia, Ritwik, Coutu, R., Dalberth, Mark J., Deguns, Eric, Liu, Guo, Sowa, Mark J., Becker, Jill S.
Format Journal Article
LanguageEnglish
Published 01.01.2010
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Summary:The demonstrated benefits provided by Atomic Layer Deposition (ALD) in producing films of exceptional uniformity, and conformality, has set the stage for its use in large area, and batch processing applications. Two key elements which drive the adoption of ALD for these applications are the ability to scale the film processes from small to large size substrates, and for the effective throughput to be increased in a manner consistent with volume production needs. In this paper we discuss the results of scaling processes from small format substrates to large format substrates, along with a presentation of the parameters which influence throughput. Additionally we describe the basic underpinnings of batch and roll-to-roll ALD systems, and the design factors which must be considered when used in a high volume setting.
ISSN:1938-5862
1938-6737
DOI:10.1149/1.3485279