Analyses of Diamond Disk Substrate Wear and Diamond Microwear in Copper Chemical Mechanical Planarization Process
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Published in | Journal of the Electrochemical Society Vol. 157; no. 3; p. H250 |
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Main Authors | , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
2010
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Online Access | Get full text |
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ISSN: | 0013-4651 |
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DOI: | 10.1149/1.3273077 |