Laser processing of LaB6-based thick film resistors

The paper studies the effect of laser processing on the structure and electrophysical properties of LaB 6 -based thick film resistors (TFR). The phases and structure of the composition are investigated. The exposure to micro-and nanosecond pulses, unlike millisecond ones, is shown to insignificantly...

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Published inPowder metallurgy and metal ceramics Vol. 47; no. 5-6; pp. 330 - 337
Main Authors Paustovskii, A. V., Rud’, B. M., Shelud’ko, V. E., Tel’nikov, E. Ya, Kremenitskii, V. V., Smertenko, P. S., Zakharchenko, I. V., Rogozinskaya, A. A.
Format Journal Article
LanguageEnglish
Published Boston Springer US 01.05.2008
Springer Nature B.V
Subjects
Ceramics
Characterization and Evaluation of Materials
Chemistry and Materials Science
Composites
Glass
Lasers
Materials Science
Metallic Materials
Natural Materials
Studies
thick film resistor (TFR)
electrophysical properties
laser processing
structure
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Summary:The paper studies the effect of laser processing on the structure and electrophysical properties of LaB 6 -based thick film resistors (TFR). The phases and structure of the composition are investigated. The exposure to micro-and nanosecond pulses, unlike millisecond ones, is shown to insignificantly increase the electrical resistance of the film and to aid in forming more uniform and fine TFR structure. LaB 6 -based TFRs are more resistant to long-term exposure to nanosecond laser radiation than BaB 6 -and (BaB 6 -LaB 6 )-based ones.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1068-1302
1573-9066
DOI:10.1007/s11106-008-9024-4