Evaluation of four inch diameter VGF-Ge substrates used for manufacturing multi-junction solar cell
Low dislocation density Ge wafers grown by a vertical gradient freeze(VGF) method used for the fabrication of multi-junction photovoltaic cells(MJC) have been studied by a whole wafer scale measurement of the lattice parameter,X-ray rocking curves,etch pit density(EPD),impurities concentration,minor...
Saved in:
Published in | Journal of semiconductors Vol. 37; no. 6; pp. 21 - 26 |
---|---|
Main Author | |
Format | Journal Article |
Language | English |
Published |
01.06.2016
|
Subjects | |
Online Access | Get full text |
ISSN | 1674-4926 |
DOI | 10.1088/1674-4926/37/6/063002 |
Cover
Abstract | Low dislocation density Ge wafers grown by a vertical gradient freeze(VGF) method used for the fabrication of multi-junction photovoltaic cells(MJC) have been studied by a whole wafer scale measurement of the lattice parameter,X-ray rocking curves,etch pit density(EPD),impurities concentration,minority carrier lifetime and residual stress.Impurity content in the VGF-Ge wafers,including that of B,is quite low although B_2O_3 encapsulation is used in the growth process.An obvious difference exists across the whole wafer regarding the distribution of etch pit density,lattice parameter,full width at half maximum(FWHM) of the X-ray rocking curve and residual stress measured by Raman spectra.These are in contrast to a reference Ge substrate wafer grown by the Cz method.The influence of the VGF-Ge substrate on the performance of the MJC is analyzed and evaluated by a comparison of the statistical results of cell parameters. |
---|---|
AbstractList | Low dislocation density Ge wafers grown by a vertical gradient freeze(VGF) method used for the fabrication of multi-junction photovoltaic cells(MJC) have been studied by a whole wafer scale measurement of the lattice parameter,X-ray rocking curves,etch pit density(EPD),impurities concentration,minority carrier lifetime and residual stress.Impurity content in the VGF-Ge wafers,including that of B,is quite low although B_2O_3 encapsulation is used in the growth process.An obvious difference exists across the whole wafer regarding the distribution of etch pit density,lattice parameter,full width at half maximum(FWHM) of the X-ray rocking curve and residual stress measured by Raman spectra.These are in contrast to a reference Ge substrate wafer grown by the Cz method.The influence of the VGF-Ge substrate on the performance of the MJC is analyzed and evaluated by a comparison of the statistical results of cell parameters. |
Author | 曹可慰 刘彤 刘京明 谢辉 陶东言 赵有文 董志远 惠峰 |
AuthorAffiliation | Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese academy of Sciences,Beijing 100083, China |
Author_xml | – sequence: 1 fullname: 曹可慰 刘彤 刘京明 谢辉 陶东言 赵有文 董志远 惠峰 |
BookMark | eNo9kM1OwzAQhH0oEm3hEZAs7iG2E__kiKq2IFXiAlytjWO3qRIH7BiJtyelVQ-7q1ntjLTfAs384C1CD5Q8UaJUToUss7JiIi9kLnIiCkLYDM2v-1u0iPFIyKRLOkdm_QNdgrEdPB4cdkMKuPXmgJsWejvagD-3m2xrcUx1HAOMNuIUbTNdBtyDTw7MmELr97hP3dhmx-TNf1ocOgjY2K67QzcOumjvL3OJPjbr99VLtnvbvq6ed5lhTI1TLxWtubO2slDyqmIgHGlcQxR3NQjgUhFe86mIqhlUpWTKmEZRyooG6mKJ-DnXhCHGYJ3-Cm0P4VdTok909ImCPlHQhdRCn-lMvseL7zD4_ff0y9UoRFVIWTJW_AHnH2kt |
Cites_doi | 10.1063/1.334800 10.1063/1.3600702 10.1002/pip.2267 10.1063/1.335737 10.1016/j.jcrysgro.2011.10.024 10.1007/s003390050983 10.1016/j.spmi.2010.12.011 10.1016/j.jcrysgro.2008.07.116 10.1107/S0365110X62001474 10.1016/j.jcrysgro.2004.11.401 10.1016/j.solmat.2008.07.014 10.1109/JPHOTOV.2012.2226142 10.1016/j.jcrysgro.2009.01.139 10.1016/j.jcrysgro.2010.04.036 10.1016/j.tsf.2010.03.035 10.1002/pssc.201400216 10.1016/j.jcrysgro.2010.03.046 10.1016/j.jcrysgro.2010.05.045 10.1016/j.mee.2010.10.015 |
ContentType | Journal Article |
DBID | 2RA 92L CQIGP W92 ~WA AAYXX CITATION |
DOI | 10.1088/1674-4926/37/6/063002 |
DatabaseName | 维普期刊资源整合服务平台 中文科技期刊数据库-CALIS站点 中文科技期刊数据库-7.0平台 中文科技期刊数据库-工程技术 中文科技期刊数据库- 镜像站点 CrossRef |
DatabaseTitle | CrossRef |
DatabaseTitleList | |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Engineering Physics |
DocumentTitleAlternate | Evaluation of four inch diameter VGF-Ge substrates used for manufacturing multi-junction solar cell |
EndPage | 26 |
ExternalDocumentID | 10_1088_1674_4926_37_6_063002 669377422 |
GroupedDBID | 02O 042 1WK 2B. 2C0 2RA 4.4 5B3 5VR 5VS 7.M 92H 92I 92L 92R 93N AAGCD AAJIO AALHV AATNI ABHWH ACAFW ACGFO ACGFS ACHIP AEFHF AFUIB AFYNE AHSEE AKPSB ALMA_UNASSIGNED_HOLDINGS ASPBG AVWKF AZFZN BBWZM CCEZO CEBXE CHBEP CJUJL CQIGP CRLBU CUBFJ CW9 EBS EDWGO EJD EQZZN FA0 IJHAN IOP IZVLO JCGBZ KNG KOT M45 N5L NS0 NT- NT. PJBAE Q02 RIN RNS ROL RPA RW3 SY9 TCJ TGT W28 W92 ~WA -SI -S~ 5XA 5XJ AAYXX ACARI AERVB AGQPQ AOAED ARNYC CAJEI CITATION Q-- TGMPQ U1G U5S |
ID | FETCH-LOGICAL-c228t-c2481b5fee9ea45992a6f0dfd085fba6a57805b505b08b2a94728ccd81123dab3 |
ISSN | 1674-4926 |
IngestDate | Tue Jul 01 03:20:31 EDT 2025 Wed Feb 14 10:18:25 EST 2024 |
IsPeerReviewed | true |
IsScholarly | true |
Issue | 6 |
Language | English |
License | http://iopscience.iop.org/info/page/text-and-data-mining http://iopscience.iop.org/page/copyright |
LinkModel | OpenURL |
MergedId | FETCHMERGED-LOGICAL-c228t-c2481b5fee9ea45992a6f0dfd085fba6a57805b505b08b2a94728ccd81123dab3 |
Notes | 11-5781/TN crystallities X-ray diffraction semiconducting germanium semiconducting gallium arsenide solar cells Low dislocation density Ge wafers grown by a vertical gradient freeze(VGF) method used for the fabrication of multi-junction photovoltaic cells(MJC) have been studied by a whole wafer scale measurement of the lattice parameter,X-ray rocking curves,etch pit density(EPD),impurities concentration,minority carrier lifetime and residual stress.Impurity content in the VGF-Ge wafers,including that of B,is quite low although B_2O_3 encapsulation is used in the growth process.An obvious difference exists across the whole wafer regarding the distribution of etch pit density,lattice parameter,full width at half maximum(FWHM) of the X-ray rocking curve and residual stress measured by Raman spectra.These are in contrast to a reference Ge substrate wafer grown by the Cz method.The influence of the VGF-Ge substrate on the performance of the MJC is analyzed and evaluated by a comparison of the statistical results of cell parameters. |
PageCount | 6 |
ParticipantIDs | crossref_primary_10_1088_1674_4926_37_6_063002 chongqing_primary_669377422 |
ProviderPackageCode | CITATION AAYXX |
PublicationCentury | 2000 |
PublicationDate | 2016-06-01 |
PublicationDateYYYYMMDD | 2016-06-01 |
PublicationDate_xml | – month: 06 year: 2016 text: 2016-06-01 day: 01 |
PublicationDecade | 2010 |
PublicationTitle | Journal of semiconductors |
PublicationTitleAlternate | Chinese Journal of Semiconductors |
PublicationYear | 2016 |
References | 11 22 12 13 15 16 Xiaosheng Qu (14) 2013; 34 Surek T (9) 2004; 10 Chaohua Jin (17) 2013; 34 18 19 1 2 3 4 5 6 7 8 20 10 21 |
References_xml | – ident: 20 doi: 10.1063/1.334800 – ident: 5 doi: 10.1063/1.3600702 – ident: 6 doi: 10.1002/pip.2267 – ident: 22 doi: 10.1063/1.335737 – ident: 8 doi: 10.1016/j.jcrysgro.2011.10.024 – ident: 1 doi: 10.1007/s003390050983 – ident: 2 doi: 10.1016/j.spmi.2010.12.011 – ident: 16 doi: 10.1016/j.jcrysgro.2008.07.116 – ident: 18 doi: 10.1107/S0365110X62001474 – ident: 7 doi: 10.1016/j.jcrysgro.2004.11.401 – ident: 3 doi: 10.1016/j.solmat.2008.07.014 – volume: 34 year: 2013 ident: 14 publication-title: Journal of Semiconductors – ident: 4 doi: 10.1109/JPHOTOV.2012.2226142 – ident: 12 doi: 10.1016/j.jcrysgro.2009.01.139 – ident: 15 doi: 10.1016/j.jcrysgro.2010.04.036 – ident: 19 doi: 10.1016/j.tsf.2010.03.035 – ident: 21 doi: 10.1002/pssc.201400216 – ident: 13 doi: 10.1016/j.jcrysgro.2010.03.046 – ident: 11 doi: 10.1016/j.jcrysgro.2010.05.045 – volume: 10 start-page: 93 issn: 0022-0248 year: 2004 ident: 9 publication-title: J Cryst Growth – volume: 34 year: 2013 ident: 17 publication-title: Journal of Semiconductors – ident: 10 doi: 10.1016/j.mee.2010.10.015 |
SSID | ssj0067441 |
Score | 1.9965262 |
Snippet | Low dislocation density Ge wafers grown by a vertical gradient freeze(VGF) method used for the fabrication of multi-junction photovoltaic cells(MJC) have been... |
SourceID | crossref chongqing |
SourceType | Index Database Publisher |
StartPage | 21 |
SubjectTerms | VGF 制造 多结 太阳能电池 少数载流子寿命 提拉法生长 腐蚀坑密度 评价 |
Title | Evaluation of four inch diameter VGF-Ge substrates used for manufacturing multi-junction solar cell |
URI | http://lib.cqvip.com/qk/94689X/201606/669377422.html |
Volume | 37 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1Lb9NAEF5FRUhwqKCAaAtoD-zJcuOs7X0cbcdp4QAcWtSb5ScFqQ40yYWfzomZcew4AiFAilarmfGM4_m0O7ueHTP22i8M7hpXrpXQ4IznGphl3NILa1vAkktVVO3znbq4Ct5eh9eTyY9R1tJmXZyV3397ruR_vAo08Cuekv0Hzw5KgQB98C-04GFo_8rH6VCqG2O-Bi5xPrflDW6o3mKai_PxfOGe184KRgeqQrtyNiuIMDG18DZvN3iqoTumSHmF7heY5EjbChe8Dm7qj4NXkYbCzIWJsBMtRJyINBDxXFifKHMRKZEqFIhCkZKABWEjTCziGbIscLVItTBWmCGLljggYsnCAnWjmlDEnkMkI6zBDtiKgjEJzIOxhBSAmdRBa7EnIkmdFOwAyQprRaxIHK5LkBeBuNeJh_hDDQneVn-XxLMzEdGfixfCapKGTuLQ_fki8ojng8nx9slM7dK8tiO-0oGLVRNHYN8f0UexQSf1y6wDIzVugPSaoE-FDOjNGJY0k7vJdkiBVAoCQx1ICB_uSa0pxeDN-w99FAG66Kurg9L-9Jkx04E29fVUTTsTWBvkZtl--gagGcVYo2Dp8hE73K5yeNRB9jGb1O0ReziqfXnE7lPucbl6wsodjPmy4QhjjjDmPYx5B2O-gzFHGIPkHd-DMd-HMScYc4TxU3a1SC-TC3f77Q-3lNKsoQ1gQRU2dW3rPAitlblqvKqpYInQFLnKQ_wYRwHxe-GZQuY20NKUZQUDjfSrvPCfsYN22dbPGdeVr5pylttm5ge1qS0s0UtpC6XzpilKc8xOhyeXfe1qvGSDe47ZWf8sByYlbhiToSMydETm60xlnSNO_qjulD3YofAFO1jfbeqXENaui1fk_5_z6Hv2 |
linkProvider | IOP Publishing |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Evaluation+of+four+inch+diameter+VGF-Ge+substrates+used+for+manufacturing+multi-junction+solar+cell&rft.jtitle=%E5%8D%8A%E5%AF%BC%E4%BD%93%E5%AD%A6%E6%8A%A5%EF%BC%9A%E8%8B%B1%E6%96%87%E7%89%88&rft.au=%E6%9B%B9%E5%8F%AF%E6%85%B0+%E5%88%98%E5%BD%A4+%E5%88%98%E4%BA%AC%E6%98%8E+%E8%B0%A2%E8%BE%89+%E9%99%B6%E4%B8%9C%E8%A8%80+%E8%B5%B5%E6%9C%89%E6%96%87+%E8%91%A3%E5%BF%97%E8%BF%9C+%E6%83%A0%E5%B3%B0&rft.date=2016-06-01&rft.issn=1674-4926&rft.issue=6&rft.spage=21&rft.epage=26&rft_id=info:doi/10.1088%2F1674-4926%2F37%2F6%2F063002&rft.externalDocID=669377422 |
thumbnail_s | http://utb.summon.serialssolutions.com/2.0.0/image/custom?url=http%3A%2F%2Fimage.cqvip.com%2Fvip1000%2Fqk%2F94689X%2F94689X.jpg |