Evaluation of four inch diameter VGF-Ge substrates used for manufacturing multi-junction solar cell

Low dislocation density Ge wafers grown by a vertical gradient freeze(VGF) method used for the fabrication of multi-junction photovoltaic cells(MJC) have been studied by a whole wafer scale measurement of the lattice parameter,X-ray rocking curves,etch pit density(EPD),impurities concentration,minor...

Full description

Saved in:
Bibliographic Details
Published inJournal of semiconductors Vol. 37; no. 6; pp. 21 - 26
Main Author 曹可慰 刘彤 刘京明 谢辉 陶东言 赵有文 董志远 惠峰
Format Journal Article
LanguageEnglish
Published 01.06.2016
Subjects
Online AccessGet full text
ISSN1674-4926
DOI10.1088/1674-4926/37/6/063002

Cover

Abstract Low dislocation density Ge wafers grown by a vertical gradient freeze(VGF) method used for the fabrication of multi-junction photovoltaic cells(MJC) have been studied by a whole wafer scale measurement of the lattice parameter,X-ray rocking curves,etch pit density(EPD),impurities concentration,minority carrier lifetime and residual stress.Impurity content in the VGF-Ge wafers,including that of B,is quite low although B_2O_3 encapsulation is used in the growth process.An obvious difference exists across the whole wafer regarding the distribution of etch pit density,lattice parameter,full width at half maximum(FWHM) of the X-ray rocking curve and residual stress measured by Raman spectra.These are in contrast to a reference Ge substrate wafer grown by the Cz method.The influence of the VGF-Ge substrate on the performance of the MJC is analyzed and evaluated by a comparison of the statistical results of cell parameters.
AbstractList Low dislocation density Ge wafers grown by a vertical gradient freeze(VGF) method used for the fabrication of multi-junction photovoltaic cells(MJC) have been studied by a whole wafer scale measurement of the lattice parameter,X-ray rocking curves,etch pit density(EPD),impurities concentration,minority carrier lifetime and residual stress.Impurity content in the VGF-Ge wafers,including that of B,is quite low although B_2O_3 encapsulation is used in the growth process.An obvious difference exists across the whole wafer regarding the distribution of etch pit density,lattice parameter,full width at half maximum(FWHM) of the X-ray rocking curve and residual stress measured by Raman spectra.These are in contrast to a reference Ge substrate wafer grown by the Cz method.The influence of the VGF-Ge substrate on the performance of the MJC is analyzed and evaluated by a comparison of the statistical results of cell parameters.
Author 曹可慰 刘彤 刘京明 谢辉 陶东言 赵有文 董志远 惠峰
AuthorAffiliation Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese academy of Sciences,Beijing 100083, China
Author_xml – sequence: 1
  fullname: 曹可慰 刘彤 刘京明 谢辉 陶东言 赵有文 董志远 惠峰
BookMark eNo9kM1OwzAQhH0oEm3hEZAs7iG2E__kiKq2IFXiAlytjWO3qRIH7BiJtyelVQ-7q1ntjLTfAs384C1CD5Q8UaJUToUss7JiIi9kLnIiCkLYDM2v-1u0iPFIyKRLOkdm_QNdgrEdPB4cdkMKuPXmgJsWejvagD-3m2xrcUx1HAOMNuIUbTNdBtyDTw7MmELr97hP3dhmx-TNf1ocOgjY2K67QzcOumjvL3OJPjbr99VLtnvbvq6ed5lhTI1TLxWtubO2slDyqmIgHGlcQxR3NQjgUhFe86mIqhlUpWTKmEZRyooG6mKJ-DnXhCHGYJ3-Cm0P4VdTok909ImCPlHQhdRCn-lMvseL7zD4_ff0y9UoRFVIWTJW_AHnH2kt
Cites_doi 10.1063/1.334800
10.1063/1.3600702
10.1002/pip.2267
10.1063/1.335737
10.1016/j.jcrysgro.2011.10.024
10.1007/s003390050983
10.1016/j.spmi.2010.12.011
10.1016/j.jcrysgro.2008.07.116
10.1107/S0365110X62001474
10.1016/j.jcrysgro.2004.11.401
10.1016/j.solmat.2008.07.014
10.1109/JPHOTOV.2012.2226142
10.1016/j.jcrysgro.2009.01.139
10.1016/j.jcrysgro.2010.04.036
10.1016/j.tsf.2010.03.035
10.1002/pssc.201400216
10.1016/j.jcrysgro.2010.03.046
10.1016/j.jcrysgro.2010.05.045
10.1016/j.mee.2010.10.015
ContentType Journal Article
DBID 2RA
92L
CQIGP
W92
~WA
AAYXX
CITATION
DOI 10.1088/1674-4926/37/6/063002
DatabaseName 维普期刊资源整合服务平台
中文科技期刊数据库-CALIS站点
中文科技期刊数据库-7.0平台
中文科技期刊数据库-工程技术
中文科技期刊数据库- 镜像站点
CrossRef
DatabaseTitle CrossRef
DatabaseTitleList
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Physics
DocumentTitleAlternate Evaluation of four inch diameter VGF-Ge substrates used for manufacturing multi-junction solar cell
EndPage 26
ExternalDocumentID 10_1088_1674_4926_37_6_063002
669377422
GroupedDBID 02O
042
1WK
2B.
2C0
2RA
4.4
5B3
5VR
5VS
7.M
92H
92I
92L
92R
93N
AAGCD
AAJIO
AALHV
AATNI
ABHWH
ACAFW
ACGFO
ACGFS
ACHIP
AEFHF
AFUIB
AFYNE
AHSEE
AKPSB
ALMA_UNASSIGNED_HOLDINGS
ASPBG
AVWKF
AZFZN
BBWZM
CCEZO
CEBXE
CHBEP
CJUJL
CQIGP
CRLBU
CUBFJ
CW9
EBS
EDWGO
EJD
EQZZN
FA0
IJHAN
IOP
IZVLO
JCGBZ
KNG
KOT
M45
N5L
NS0
NT-
NT.
PJBAE
Q02
RIN
RNS
ROL
RPA
RW3
SY9
TCJ
TGT
W28
W92
~WA
-SI
-S~
5XA
5XJ
AAYXX
ACARI
AERVB
AGQPQ
AOAED
ARNYC
CAJEI
CITATION
Q--
TGMPQ
U1G
U5S
ID FETCH-LOGICAL-c228t-c2481b5fee9ea45992a6f0dfd085fba6a57805b505b08b2a94728ccd81123dab3
ISSN 1674-4926
IngestDate Tue Jul 01 03:20:31 EDT 2025
Wed Feb 14 10:18:25 EST 2024
IsPeerReviewed true
IsScholarly true
Issue 6
Language English
License http://iopscience.iop.org/info/page/text-and-data-mining
http://iopscience.iop.org/page/copyright
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-c228t-c2481b5fee9ea45992a6f0dfd085fba6a57805b505b08b2a94728ccd81123dab3
Notes 11-5781/TN
crystallities X-ray diffraction semiconducting germanium semiconducting gallium arsenide solar cells
Low dislocation density Ge wafers grown by a vertical gradient freeze(VGF) method used for the fabrication of multi-junction photovoltaic cells(MJC) have been studied by a whole wafer scale measurement of the lattice parameter,X-ray rocking curves,etch pit density(EPD),impurities concentration,minority carrier lifetime and residual stress.Impurity content in the VGF-Ge wafers,including that of B,is quite low although B_2O_3 encapsulation is used in the growth process.An obvious difference exists across the whole wafer regarding the distribution of etch pit density,lattice parameter,full width at half maximum(FWHM) of the X-ray rocking curve and residual stress measured by Raman spectra.These are in contrast to a reference Ge substrate wafer grown by the Cz method.The influence of the VGF-Ge substrate on the performance of the MJC is analyzed and evaluated by a comparison of the statistical results of cell parameters.
PageCount 6
ParticipantIDs crossref_primary_10_1088_1674_4926_37_6_063002
chongqing_primary_669377422
ProviderPackageCode CITATION
AAYXX
PublicationCentury 2000
PublicationDate 2016-06-01
PublicationDateYYYYMMDD 2016-06-01
PublicationDate_xml – month: 06
  year: 2016
  text: 2016-06-01
  day: 01
PublicationDecade 2010
PublicationTitle Journal of semiconductors
PublicationTitleAlternate Chinese Journal of Semiconductors
PublicationYear 2016
References 11
22
12
13
15
16
Xiaosheng Qu (14) 2013; 34
Surek T (9) 2004; 10
Chaohua Jin (17) 2013; 34
18
19
1
2
3
4
5
6
7
8
20
10
21
References_xml – ident: 20
  doi: 10.1063/1.334800
– ident: 5
  doi: 10.1063/1.3600702
– ident: 6
  doi: 10.1002/pip.2267
– ident: 22
  doi: 10.1063/1.335737
– ident: 8
  doi: 10.1016/j.jcrysgro.2011.10.024
– ident: 1
  doi: 10.1007/s003390050983
– ident: 2
  doi: 10.1016/j.spmi.2010.12.011
– ident: 16
  doi: 10.1016/j.jcrysgro.2008.07.116
– ident: 18
  doi: 10.1107/S0365110X62001474
– ident: 7
  doi: 10.1016/j.jcrysgro.2004.11.401
– ident: 3
  doi: 10.1016/j.solmat.2008.07.014
– volume: 34
  year: 2013
  ident: 14
  publication-title: Journal of Semiconductors
– ident: 4
  doi: 10.1109/JPHOTOV.2012.2226142
– ident: 12
  doi: 10.1016/j.jcrysgro.2009.01.139
– ident: 15
  doi: 10.1016/j.jcrysgro.2010.04.036
– ident: 19
  doi: 10.1016/j.tsf.2010.03.035
– ident: 21
  doi: 10.1002/pssc.201400216
– ident: 13
  doi: 10.1016/j.jcrysgro.2010.03.046
– ident: 11
  doi: 10.1016/j.jcrysgro.2010.05.045
– volume: 10
  start-page: 93
  issn: 0022-0248
  year: 2004
  ident: 9
  publication-title: J Cryst Growth
– volume: 34
  year: 2013
  ident: 17
  publication-title: Journal of Semiconductors
– ident: 10
  doi: 10.1016/j.mee.2010.10.015
SSID ssj0067441
Score 1.9965262
Snippet Low dislocation density Ge wafers grown by a vertical gradient freeze(VGF) method used for the fabrication of multi-junction photovoltaic cells(MJC) have been...
SourceID crossref
chongqing
SourceType Index Database
Publisher
StartPage 21
SubjectTerms VGF
制造
多结
太阳能电池
少数载流子寿命
提拉法生长
腐蚀坑密度
评价
Title Evaluation of four inch diameter VGF-Ge substrates used for manufacturing multi-junction solar cell
URI http://lib.cqvip.com/qk/94689X/201606/669377422.html
Volume 37
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1Lb9NAEF5FRUhwqKCAaAtoD-zJcuOs7X0cbcdp4QAcWtSb5ScFqQ40yYWfzomZcew4AiFAilarmfGM4_m0O7ueHTP22i8M7hpXrpXQ4IznGphl3NILa1vAkktVVO3znbq4Ct5eh9eTyY9R1tJmXZyV3397ruR_vAo08Cuekv0Hzw5KgQB98C-04GFo_8rH6VCqG2O-Bi5xPrflDW6o3mKai_PxfOGe184KRgeqQrtyNiuIMDG18DZvN3iqoTumSHmF7heY5EjbChe8Dm7qj4NXkYbCzIWJsBMtRJyINBDxXFifKHMRKZEqFIhCkZKABWEjTCziGbIscLVItTBWmCGLljggYsnCAnWjmlDEnkMkI6zBDtiKgjEJzIOxhBSAmdRBa7EnIkmdFOwAyQprRaxIHK5LkBeBuNeJh_hDDQneVn-XxLMzEdGfixfCapKGTuLQ_fki8ojng8nx9slM7dK8tiO-0oGLVRNHYN8f0UexQSf1y6wDIzVugPSaoE-FDOjNGJY0k7vJdkiBVAoCQx1ICB_uSa0pxeDN-w99FAG66Kurg9L-9Jkx04E29fVUTTsTWBvkZtl--gagGcVYo2Dp8hE73K5yeNRB9jGb1O0ReziqfXnE7lPucbl6wsodjPmy4QhjjjDmPYx5B2O-gzFHGIPkHd-DMd-HMScYc4TxU3a1SC-TC3f77Q-3lNKsoQ1gQRU2dW3rPAitlblqvKqpYInQFLnKQ_wYRwHxe-GZQuY20NKUZQUDjfSrvPCfsYN22dbPGdeVr5pylttm5ge1qS0s0UtpC6XzpilKc8xOhyeXfe1qvGSDe47ZWf8sByYlbhiToSMydETm60xlnSNO_qjulD3YofAFO1jfbeqXENaui1fk_5_z6Hv2
linkProvider IOP Publishing
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Evaluation+of+four+inch+diameter+VGF-Ge+substrates+used+for+manufacturing+multi-junction+solar+cell&rft.jtitle=%E5%8D%8A%E5%AF%BC%E4%BD%93%E5%AD%A6%E6%8A%A5%EF%BC%9A%E8%8B%B1%E6%96%87%E7%89%88&rft.au=%E6%9B%B9%E5%8F%AF%E6%85%B0+%E5%88%98%E5%BD%A4+%E5%88%98%E4%BA%AC%E6%98%8E+%E8%B0%A2%E8%BE%89+%E9%99%B6%E4%B8%9C%E8%A8%80+%E8%B5%B5%E6%9C%89%E6%96%87+%E8%91%A3%E5%BF%97%E8%BF%9C+%E6%83%A0%E5%B3%B0&rft.date=2016-06-01&rft.issn=1674-4926&rft.issue=6&rft.spage=21&rft.epage=26&rft_id=info:doi/10.1088%2F1674-4926%2F37%2F6%2F063002&rft.externalDocID=669377422
thumbnail_s http://utb.summon.serialssolutions.com/2.0.0/image/custom?url=http%3A%2F%2Fimage.cqvip.com%2Fvip1000%2Fqk%2F94689X%2F94689X.jpg