Quantitative Modelling of Deposition of Airborne Molecular Contamination
The build-up of gaseous contamination from the ambient air on the surface of a wafer as a function of exposure time is quantitatively modelled. The calculation shows that the transport in the ambient air plays a major role.
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| Published in | ECS transactions Vol. 92; no. 2; pp. 237 - 244 |
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| Main Author | |
| Format | Journal Article |
| Language | English |
| Published |
The Electrochemical Society, Inc
03.07.2019
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| Online Access | Get full text |
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| Summary: | The build-up of gaseous contamination from the ambient air on the surface of a wafer as a function of exposure time is quantitatively modelled. The calculation shows that the transport in the ambient air plays a major role. |
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| ISSN: | 1938-5862 1938-6737 1938-6737 1938-5862 |
| DOI: | 10.1149/09202.0237ecst |