Extraction of Channel Length Independent Series Resistance for Deeply Scaled Metal-Oxide-Semiconductor Field-Effect Transistors

The recently developed four Rsd extraction methods from a single device, involving the constant-mobility method,the direct Id Vgs method, the conductance method and the Y-tunctlon metnoa, are evaluatea on 32 nm n-channel metal-oxide-semiconductor field-effect transistors (nMOSFETs). It is found that...

Full description

Saved in:
Bibliographic Details
Published inChinese physics letters Vol. 31; no. 9; pp. 141 - 143
Main Author 马丽娟 纪小丽 陈原聪 夏好广 朱晨昕 郭强 闫锋
Format Journal Article
LanguageEnglish
Published 01.09.2014
Subjects
Online AccessGet full text
ISSN0256-307X
1741-3540
DOI10.1088/0256-307X/31/9/097302

Cover

Abstract The recently developed four Rsd extraction methods from a single device, involving the constant-mobility method,the direct Id Vgs method, the conductance method and the Y-tunctlon metnoa, are evaluatea on 32 nm n-channel metal-oxide-semiconductor field-effect transistors (nMOSFETs). It is found that Rsd achieved from the constant- mobility method exhibits the channel length independent characteristics. The L-dependent Rsd extracted from the other three methods is proven to be associated with the gate-voltage-induced mobility degradation in the extraction procedures. Based on L-dependent behaviors of Rsd, a new method is proposed for accurate series resistance extraction on deeply scaled MOSFETs.
AbstractList The recently developed four Rsd extraction methods from a single device, involving the constant-mobility method,the direct Id Vgs method, the conductance method and the Y-tunctlon metnoa, are evaluatea on 32 nm n-channel metal-oxide-semiconductor field-effect transistors (nMOSFETs). It is found that Rsd achieved from the constant- mobility method exhibits the channel length independent characteristics. The L-dependent Rsd extracted from the other three methods is proven to be associated with the gate-voltage-induced mobility degradation in the extraction procedures. Based on L-dependent behaviors of Rsd, a new method is proposed for accurate series resistance extraction on deeply scaled MOSFETs.
Author 马丽娟 纪小丽 陈原聪 夏好广 朱晨昕 郭强 闫锋
AuthorAffiliation School of Electronic Science and Engineering, Nanjing University, Nanjing 210093 Wuhan Xinxin Semiconductor Manufacturing Corporation, Wuhan 430205
Author_xml – sequence: 1
  fullname: 马丽娟 纪小丽 陈原聪 夏好广 朱晨昕 郭强 闫锋
BookMark eNo9kE1rAjEURUOxULX9CYXQ_dR8zGQyy2K1FSxCtdDdkL550SljxiYp6Kp_vSOKm_c291y4Z0B6rnVIyD1nj5xpPWIiU4lk-edI8lExYkUumbgifZ6nPJFZynqkf8nckEEI34xxrjnvk7_JPnoDsW4dbS0db4xz2NA5unXc0JmrcIfdcZEu0dcY6DuGOkTjAKltPX1G3DUHugTTYEXfMJomWezrCpMlbmtoXfULsctNa2yqZGItQqQrb9yxpfXhllxb0wS8O_8h-ZhOVuPXZL54mY2f5gkIoWOSpiLTYBTrxqUpaK7TSgNY0BaAgehqlVQmY2luv_JK2W5vJlAU1oAEVHJIslMv-DYEj7bc-Xpr_KHkrDxaLI-GyqOhUvKyKE8WO-7hzG1at_6p3foCKiUEV1nB5D_P83V4
Cites_doi 10.1109/55.974590
10.1016/j.microrel.2009.05.005
10.1109/LED.2009.2026592
10.1149/1.3005569
10.1088/0268-1242/24/10/105015
10.1109/LED.2011.2158183
10.1088/0268-1242/28/11/115009
10.1088/0256-307X/22/8/055
10.1109/LED.2007.909850
10.1016/0038-1101(95)00269-3
10.1109/16.24353
10.1109/TNANO.2009.2028024
10.7498/aps.60.017202
10.1143/JJAP.18.953
ContentType Journal Article
DBID 2RA
92L
CQIGP
~WA
AAYXX
CITATION
DOI 10.1088/0256-307X/31/9/097302
DatabaseName 维普期刊资源整合服务平台
中文科技期刊数据库-CALIS站点
中文科技期刊数据库-7.0平台
中文科技期刊数据库- 镜像站点
CrossRef
DatabaseTitle CrossRef
DatabaseTitleList
DeliveryMethod fulltext_linktorsrc
Discipline Physics
DocumentTitleAlternate Extraction of Channel Length Independent Series Resistance for Deeply Scaled Metal-Oxide-Semiconductor Field-Effect Transistors
EISSN 1741-3540
EndPage 143
ExternalDocumentID 10_1088_0256_307X_31_9_097302
662216590
GroupedDBID 02O
042
1JI
1PV
1WK
29B
2RA
4.4
5B3
5GY
5VR
5VS
5ZH
7.M
7.Q
92L
AAGCD
AAJIO
AAJKP
AALHV
AATNI
ABHWH
ABJNI
ABQJV
ACAFW
ACGFS
ACHIP
AEFHF
AENEX
AFUIB
AFYNE
AHSEE
AKPSB
ALMA_UNASSIGNED_HOLDINGS
ASPBG
ATQHT
AVWKF
AZFZN
BBWZM
CEBXE
CJUJL
CQIGP
CRLBU
CS3
EBS
EDWGO
EJD
EMSAF
EPQRW
EQZZN
FEDTE
HAK
HVGLF
IHE
IJHAN
IOP
IZVLO
JCGBZ
KNG
KOT
LAP
M45
N5L
N9A
NS0
NT-
NT.
P2P
PJBAE
Q02
R4D
RIN
RNS
RO9
ROL
RPA
RW3
S3P
SY9
T37
UCJ
W28
XPP
~02
~WA
-SA
-S~
AAYXX
ACARI
ADEQX
AERVB
AGQPQ
AOAED
ARNYC
CAJEA
CITATION
Q--
TGP
U1G
U5K
ID FETCH-LOGICAL-c228t-44258ca6009744c8184d8ccfc8fcc0c2fec636a5047fb7d6f02552e29fac3ce63
ISSN 0256-307X
IngestDate Tue Jul 01 01:35:24 EDT 2025
Wed Feb 14 10:34:15 EST 2024
IsPeerReviewed true
IsScholarly true
Issue 9
Language English
License http://iopscience.iop.org/info/page/text-and-data-mining
http://iopscience.iop.org/page/copyright
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-c228t-44258ca6009744c8184d8ccfc8fcc0c2fec636a5047fb7d6f02552e29fac3ce63
Notes 11-1959/O4
MA Li-Juan, JI Xiao-Li, CHEN Yuan-Cong, XIA Hao-Guang, ZHU Chen-Xin, GUO Qiang, YAN Feng ( 1. School of Electronic Science and Engineering, Nanjing University, Nanfing 210093 2. Wuhan Xinxin Semiconductor Manufacturing Corporation, Wuhan 430205)
The recently developed four Rsd extraction methods from a single device, involving the constant-mobility method,the direct Id Vgs method, the conductance method and the Y-tunctlon metnoa, are evaluatea on 32 nm n-channel metal-oxide-semiconductor field-effect transistors (nMOSFETs). It is found that Rsd achieved from the constant- mobility method exhibits the channel length independent characteristics. The L-dependent Rsd extracted from the other three methods is proven to be associated with the gate-voltage-induced mobility degradation in the extraction procedures. Based on L-dependent behaviors of Rsd, a new method is proposed for accurate series resistance extraction on deeply scaled MOSFETs.
PageCount 3
ParticipantIDs crossref_primary_10_1088_0256_307X_31_9_097302
chongqing_primary_662216590
ProviderPackageCode CITATION
AAYXX
PublicationCentury 2000
PublicationDate 2014-09-01
PublicationDateYYYYMMDD 2014-09-01
PublicationDate_xml – month: 09
  year: 2014
  text: 2014-09-01
  day: 01
PublicationDecade 2010
PublicationTitle Chinese physics letters
PublicationTitleAlternate Chinese Physics Letters
PublicationYear 2014
References Chang Y H (4) 2007; 87
11
Muci J (7) 2009; 24
12
14
Chang J G (16) 2013; 28
Wolf S (17) 1995; 3
15
Zhu S Y (3) 2005; 22
18
Terada K (1) 1979; 18
Fleury D (8) 2008
Li B (2) 2011; 60
Campbell J P (13) 2012
5
6
9
10
References_xml – ident: 18
  doi: 10.1109/55.974590
– ident: 6
  doi: 10.1016/j.microrel.2009.05.005
– ident: 5
  doi: 10.1109/LED.2009.2026592
– ident: 10
  doi: 10.1149/1.3005569
– volume: 24
  start-page: 105015
  issn: 0268-1242
  year: 2009
  ident: 7
  publication-title: Semicond. Sci. Technol.
  doi: 10.1088/0268-1242/24/10/105015
– ident: 12
  doi: 10.1109/LED.2011.2158183
– volume: 28
  start-page: 115009
  issn: 0268-1242
  year: 2013
  ident: 16
  publication-title: Semicond. Sci. Technol.
  doi: 10.1088/0268-1242/28/11/115009
– volume: 22
  start-page: 2020
  issn: 0256-307X
  year: 2005
  ident: 3
  publication-title: Chin. Phys. Lett.
  doi: 10.1088/0256-307X/22/8/055
– ident: 11
  doi: 10.1109/LED.2007.909850
– ident: 14
  doi: 10.1016/0038-1101(95)00269-3
– ident: 9
  doi: 10.1109/16.24353
– ident: 15
  doi: 10.1109/TNANO.2009.2028024
– start-page: 147
  year: 2012
  ident: 13
– volume: 60
  start-page: 017202
  issn: 0372-736X
  year: 2011
  ident: 2
  publication-title: Acta Phys. Sin.
  doi: 10.7498/aps.60.017202
– start-page: 160
  year: 2008
  ident: 8
– volume: 18
  start-page: 953
  issn: 1347-4065
  year: 1979
  ident: 1
  publication-title: Jpn. J. Appl. Phys.
  doi: 10.1143/JJAP.18.953
– volume: 87
  year: 2007
  ident: 4
  publication-title: Electron. Devices Solid-State Circuits
– volume: 3
  start-page: 250
  year: 1995
  ident: 17
  publication-title: Lattice Press
SSID ssj0011811
Score 2.0151927
Snippet The recently developed four Rsd extraction methods from a single device, involving the constant-mobility method,the direct Id Vgs method, the conductance...
SourceID crossref
chongqing
SourceType Index Database
Publisher
StartPage 141
SubjectTerms MOSFET
Rsd
串联电阻
半导体场效应晶体管
提取方法
氧化物
通道长度
金属
Title Extraction of Channel Length Independent Series Resistance for Deeply Scaled Metal-Oxide-Semiconductor Field-Effect Transistors
URI http://lib.cqvip.com/qk/84212X/201409/662216590.html
Volume 31
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV3da9UwFA_bRPBF_MQ5lSDm6dLdfqRp8tjctUxxTnCDvZU2bTdBeufWwfDFf91zkra34AfqSwlNek7a80vyS3pyQsgbE8OgWdeBF9Yi8niV-F5VQbtqqkq0Fa9iWeJu5KMP4vCUvzuLz7a2X8-8lm76at98--W-kv-xKtwDu-Iu2X-w7CQUbkAa7AtXsDBc_8rG2W1_NZz1bb0qSnRaWbxvuvP-Alr-eMBtjz0CzIhxrR7pIrZl9C48aJrLL9B3gJmAdh41wMO949vPdeN9Qpf5dYexYKFcjl5u3hDn2A5uNrbI9ZzYsowzLVl6wLKYKc00JBImFUsVJpTPpMAsnbNUs0wwmbI0ZlnO9IqplGWSSXgqwCwFucnwuJxcbVlmhaWrQZW2qlLJVL7AwhoEplYF6MqnQgt8TqEgzJMZFLfKAii9sBK4LR5jdZxMraCaC1uT1VglhZowAfpiK1NGw9vCC-jUqUnsy0ECZOr5gkrAJ4-xsd8FFohLcmduiHTjAhAvD5fIZk1Czfr9wEXvGihE4CJP_TQ6QY9uA3kM8iEd4XCl7B806GrDzaA8uUoKEYaBiJW_Te6ESWJdEd4ef5z-lAFDs6dCjkLHXWpSLqd7yyhYqqVTgTFELtbd-VdgRjMuNiNVJw_I_WE2RFMH7Ydkq-kekbvWK9lcPybfNwCn65YOAKcO4HQGcOoATjcApwBw6gBOHcDpbwFO5wCnM4A_Iad5drI69IYTQzwThrL3OIxA0pQCdydxboCM8loa0xrZGuObEMSISJSxz5O2SmrR4ow6bELVliYyjYiekp1u3TXPCAUq7itfmiBKDC9rmEdFMLvGAJkSOJ9Su2Rv-o7FpYsMU0zG2iX745edMq27h5QFmqVAsxRRUKjCmeX5H8XtkXsbpL4gO_3VTfMSyHBfvbJo-AE_dI9x
linkProvider IOP Publishing
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Extraction+of+Channel+Length+Independent+Series+Resistance+for+Deeply+Scaled+Metal-Oxide-Semiconductor+Field-Effect+Transistors&rft.jtitle=%E4%B8%AD%E5%9B%BD%E7%89%A9%E7%90%86%E5%BF%AB%E6%8A%A5%EF%BC%9A%E8%8B%B1%E6%96%87%E7%89%88&rft.au=%E9%A9%AC%E4%B8%BD%E5%A8%9F+%E7%BA%AA%E5%B0%8F%E4%B8%BD+%E9%99%88%E5%8E%9F%E8%81%AA+%E5%A4%8F%E5%A5%BD%E5%B9%BF+%E6%9C%B1%E6%99%A8%E6%98%95+%E9%83%AD%E5%BC%BA+%E9%97%AB%E9%94%8B&rft.date=2014-09-01&rft.issn=0256-307X&rft.eissn=1741-3540&rft.issue=9&rft.spage=141&rft.epage=143&rft_id=info:doi/10.1088%2F0256-307X%2F31%2F9%2F097302&rft.externalDocID=662216590
thumbnail_s http://utb.summon.serialssolutions.com/2.0.0/image/custom?url=http%3A%2F%2Fimage.cqvip.com%2Fvip1000%2Fqk%2F84212X%2F84212X.jpg