Extraction of Channel Length Independent Series Resistance for Deeply Scaled Metal-Oxide-Semiconductor Field-Effect Transistors
The recently developed four Rsd extraction methods from a single device, involving the constant-mobility method,the direct Id Vgs method, the conductance method and the Y-tunctlon metnoa, are evaluatea on 32 nm n-channel metal-oxide-semiconductor field-effect transistors (nMOSFETs). It is found that...
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Published in | Chinese physics letters Vol. 31; no. 9; pp. 141 - 143 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
01.09.2014
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Subjects | |
Online Access | Get full text |
ISSN | 0256-307X 1741-3540 |
DOI | 10.1088/0256-307X/31/9/097302 |
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Summary: | The recently developed four Rsd extraction methods from a single device, involving the constant-mobility method,the direct Id Vgs method, the conductance method and the Y-tunctlon metnoa, are evaluatea on 32 nm n-channel metal-oxide-semiconductor field-effect transistors (nMOSFETs). It is found that Rsd achieved from the constant- mobility method exhibits the channel length independent characteristics. The L-dependent Rsd extracted from the other three methods is proven to be associated with the gate-voltage-induced mobility degradation in the extraction procedures. Based on L-dependent behaviors of Rsd, a new method is proposed for accurate series resistance extraction on deeply scaled MOSFETs. |
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Bibliography: | 11-1959/O4 MA Li-Juan, JI Xiao-Li, CHEN Yuan-Cong, XIA Hao-Guang, ZHU Chen-Xin, GUO Qiang, YAN Feng ( 1. School of Electronic Science and Engineering, Nanjing University, Nanfing 210093 2. Wuhan Xinxin Semiconductor Manufacturing Corporation, Wuhan 430205) The recently developed four Rsd extraction methods from a single device, involving the constant-mobility method,the direct Id Vgs method, the conductance method and the Y-tunctlon metnoa, are evaluatea on 32 nm n-channel metal-oxide-semiconductor field-effect transistors (nMOSFETs). It is found that Rsd achieved from the constant- mobility method exhibits the channel length independent characteristics. The L-dependent Rsd extracted from the other three methods is proven to be associated with the gate-voltage-induced mobility degradation in the extraction procedures. Based on L-dependent behaviors of Rsd, a new method is proposed for accurate series resistance extraction on deeply scaled MOSFETs. |
ISSN: | 0256-307X 1741-3540 |
DOI: | 10.1088/0256-307X/31/9/097302 |