Morphological-and Microstructural Evolution and Related Impurity Incorporation in Non-Polar a-Plane GaN Grown on r-Sapphire Substrates

Effects of the growth temperature on morphological and microstructural evolution of a-plane GaN films grown on r-plane sapphires by metal organic chemical vapor deposition are investigated by atomic force microscopy and secondary ion mass spectroscopy (SIMS). Surface morphology, structural quality a...

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Published inChinese physics letters Vol. 32; no. 9; pp. 154 - 157
Main Author 蒋仁渊 许晟瑞 张进成 姜腾 江海清 王之哲 樊永祥 郝跃
Format Journal Article
LanguageEnglish
Published 01.09.2015
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ISSN0256-307X
1741-3540
DOI10.1088/0256-307X/32/9/098102

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Summary:Effects of the growth temperature on morphological and microstructural evolution of a-plane GaN films grown on r-plane sapphires by metal organic chemical vapor deposition are investigated by atomic force microscopy and secondary ion mass spectroscopy (SIMS). Surface morphology, structural quality and related impurity incorpora- tion are very sensitive to the growth temperature. A significant difference of yellow luminescence is observed and attributed to the incorporation of carbon into GaN films, which is confirmed by SIMS analysis. Our results show that the sample with triangular-pit morphology has sample with pentagon-like pit morphology, which is significantly higher concentrations of oxygen than the other induced by the existence of an N-face in triangular pits.
Bibliography:Effects of the growth temperature on morphological and microstructural evolution of a-plane GaN films grown on r-plane sapphires by metal organic chemical vapor deposition are investigated by atomic force microscopy and secondary ion mass spectroscopy (SIMS). Surface morphology, structural quality and related impurity incorpora- tion are very sensitive to the growth temperature. A significant difference of yellow luminescence is observed and attributed to the incorporation of carbon into GaN films, which is confirmed by SIMS analysis. Our results show that the sample with triangular-pit morphology has sample with pentagon-like pit morphology, which is significantly higher concentrations of oxygen than the other induced by the existence of an N-face in triangular pits.
11-1959/O4
JIANG Ren-Yuan, XU Sheng-Rui, ZHANG Jin-Cheng, JIANG Teng, JIANG Hai-Qing, WANG Zhi-Zhe, FAN Yong-Xiang, HAO Yue( Key Lab of Wide Band-Gap Semiconductor Technology, School of Mieroelectronics, Xidian University, Xi'an 710071 )
ISSN:0256-307X
1741-3540
DOI:10.1088/0256-307X/32/9/098102