Nongrowth regime in microwave chemical vapor deposition reactor due to formation of plasma nonhomogeneity
Abstract A new form of microwave discharge with a filament inside plasma volume was investigated in a microwave plasma‐assisted chemical vapor deposition (CVD) reactor. The threshold values of methane content in a hydrogen–methane gas mixture, gas pressure, and microwave power for discharge transiti...
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Published in | Plasma processes and polymers Vol. 20; no. 10 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Weinheim
Wiley Subscription Services, Inc
01.10.2023
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Subjects | |
Online Access | Get full text |
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Summary: | Abstract
A new form of microwave discharge with a filament inside plasma volume was investigated in a microwave plasma‐assisted chemical vapor deposition (CVD) reactor. The threshold values of methane content in a hydrogen–methane gas mixture, gas pressure, and microwave power for discharge transition to the new form were found. The parameters' range of existence of the new form of discharge was investigated in three types of CVD reactors. Measurements of the electron density, gas temperature, and spatial distributions of the plasma optical emission lines intensity were carried out for both forms of the discharge. The reasons for the transition of the discharge to a new form and the possibility of using the new discharge form in the microwave plasma‐assisted (MPA) CVD reactor are discussed. |
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ISSN: | 1612-8850 1612-8869 |
DOI: | 10.1002/ppap.202300073 |