Nongrowth regime in microwave chemical vapor deposition reactor due to formation of plasma nonhomogeneity

Abstract A new form of microwave discharge with a filament inside plasma volume was investigated in a microwave plasma‐assisted chemical vapor deposition (CVD) reactor. The threshold values of methane content in a hydrogen–methane gas mixture, gas pressure, and microwave power for discharge transiti...

Full description

Saved in:
Bibliographic Details
Published inPlasma processes and polymers Vol. 20; no. 10
Main Authors Bogdanov, Sergey A., Vikharev, Anatoly L., Gorbachev, Aleksey M., Radishev, Dmitry B., Lobaev, Mikhail A.
Format Journal Article
LanguageEnglish
Published Weinheim Wiley Subscription Services, Inc 01.10.2023
Subjects
Chemical vapor deposition
Electron density
Gas mixtures
Gas pressure
Gas temperature
Methane
Microwave discharge
Microwave plasmas
Spatial distribution
Online AccessGet full text

Cover

More Information
Summary:Abstract A new form of microwave discharge with a filament inside plasma volume was investigated in a microwave plasma‐assisted chemical vapor deposition (CVD) reactor. The threshold values of methane content in a hydrogen–methane gas mixture, gas pressure, and microwave power for discharge transition to the new form were found. The parameters' range of existence of the new form of discharge was investigated in three types of CVD reactors. Measurements of the electron density, gas temperature, and spatial distributions of the plasma optical emission lines intensity were carried out for both forms of the discharge. The reasons for the transition of the discharge to a new form and the possibility of using the new discharge form in the microwave plasma‐assisted (MPA) CVD reactor are discussed.
ISSN:1612-8850
1612-8869
DOI:10.1002/ppap.202300073