Analysis of thickness distribution and the crystal structure in a Wehner spot

The material distribution and structural characteristics of a thin film deposited by ion bombardment are discussed. Specifically, the sputtering of the (100) plane of Cu monocrystal by Ar ions was investigated. Experimental equipment and test procedures are described and test results are presented....

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Bibliographic Details
Published inJournal of materials science Vol. 16; no. 7; pp. 2016 - 2019
Main Authors Nenadovic, T, Mihac, T, Spasic, V
Format Journal Article
LanguageEnglish
Published 01.07.1981
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Summary:The material distribution and structural characteristics of a thin film deposited by ion bombardment are discussed. Specifically, the sputtering of the (100) plane of Cu monocrystal by Ar ions was investigated. Experimental equipment and test procedures are described and test results are presented. It was concluded that the material deposited was inhomogeneous both with respect to thickness and crystal structure. The thickness observed on the periphery of the Wehner spot was several times that at the center, while the crystal structure varied from areas of large irregular grains to areas of small grains. Various explanations for the inhomogenous deposition are discussed.--G.P.K.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0022-2461
1573-4803
DOI:10.1007/BF00540654