Adsorption or deoxidation of H2 interacted with Fe3O4 surface under different H coverage: A DFT study
[Display omitted] •For Fe3O4 surfaces, the surface O site is the most favorable adsorption site for H and the dissociated H2 is adsorbed on the adjacent surface O atoms to form surface OH.•Dissociation of H2 on Fe3O4 two surfaces are easy, and H easily migrates between O sites and from O to Fe sites...
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Published in | Applied surface science Vol. 502; p. 144097 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
01.02.2020
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Subjects | |
Online Access | Get full text |
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Summary: | [Display omitted]
•For Fe3O4 surfaces, the surface O site is the most favorable adsorption site for H and the dissociated H2 is adsorbed on the adjacent surface O atoms to form surface OH.•Dissociation of H2 on Fe3O4 two surfaces are easy, and H easily migrates between O sites and from O to Fe sites.•The degree of reduction difficulty of surface O can be regulated by controlling the coverage of H by adjusting the reaction conditions.
The adsorption and dissociation of H2, the migration ability of H atom, as well as the competition relationship between adsorption or deoxidation of H2 with increasing of H adsorption coverage on the Fe3O4 (1 1 1)-Fetet1 and (0 0 1)-B surfaces were systematically studied by DFT + U method. The adsorption energy and the optimal dissociation barrier of H2 on two Fe3O4 surface is about 0.04 eV and 1.0 eV, respectively. The surface O site is the most favorable adsorption site for H and the dissociated H2 is adsorbed on the adjacent surface O atoms. When H coverage is low, H preferentially adsorbs to the most stable O sites with the maximum adsorption heat. With the increasing of H coverage, the adsorption heat gradually decreases. When H coverage approaches saturated coverage, H2 reacted with surface O to form H2O become more favorable than direct adsorption. The phase diagrams of H adsorption/deoxidation at different temperature and pressure ranges were calculated. It can be found that the reduction of surface O become more favorable with the increasing of H coverage. The results indicate that the degree of reduction difficulty of surface O can be controlled by changing the coverage of H by adjusting the reaction condition. |
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ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2019.144097 |