Structural Effects in Determining Silicon Concentration in Al - Si Alloys by X-Ray Fluorescence and Mass Spectrometry

The paper discusses how the structure of aluminum alloys affects the determination of silicon by x-ray fluorescence and glow-discharge mass spectrometry. As the silicon microcrystals enlarge, there tends to be an exaggeration of its content. The kinetics of the silicon-ion concentration change in th...

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Published inPowder metallurgy and metal ceramics Vol. 44; no. 3-4; pp. 191 - 195
Main Authors Kurochkin, Vladimir D, Kravchenko, Larisa P, Kuz'menko, Lyudmila N, Tsurpal, Lyudmila A
Format Journal Article
LanguageEnglish
Published New York Springer Nature B.V 01.03.2005
Subjects
Alloys
Aluminum base alloys
Cathode sputtering
Fluorescence
Mass spectrometry
Silicon
Surface layer
X-rays
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Summary:The paper discusses how the structure of aluminum alloys affects the determination of silicon by x-ray fluorescence and glow-discharge mass spectrometry. As the silicon microcrystals enlarge, there tends to be an exaggeration of its content. The kinetics of the silicon-ion concentration change in the glow-discharge plasma show that cathode sputtering causes reconstruction of the surface layer. The processes are different for a binary alloy (with 3% silicon) as against multicomponent alloys. A method is proposed for diminishing the structural effect, which is based on preliminary treatment of the surface with microsecond pulse discharges, which results in a microcrystalline surface layer of thickness 20-50 µm. This suppresses the structural effects and provides reliable data on the silicon content.[PUBLICATION ABSTRACT]
Bibliography:ObjectType-Article-2
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ISSN:1068-1302
1573-9066
DOI:10.1007/s11106-005-0079-1