Laser microfabrication of thin films: Part two

In this paper, the second of a series of three reviewing the subject of laser microchemical processing — a potentially powerful technique for the fabrication of a variety of micro and opto-electronics devices — the main mechanisms of laser-induced deposition of thin films are described. Many example...

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Published inOptics and laser technology Vol. 19; no. 1; pp. 19 - 25
Main Authors Micheli, F., Boyd, I.W.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 1987
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ISSN0030-3992
1879-2545
DOI10.1016/0030-3992(87)90006-5

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Abstract In this paper, the second of a series of three reviewing the subject of laser microchemical processing — a potentially powerful technique for the fabrication of a variety of micro and opto-electronics devices — the main mechanisms of laser-induced deposition of thin films are described. Many examples of photolytic and pyrolytic deposition of insulating, conducting and semiconducting materials, from either gas or liquid phase are given.
AbstractList In this paper, the second of a series of three reviewing the subject of laser microchemical processing — a potentially powerful technique for the fabrication of a variety of micro and opto-electronics devices — the main mechanisms of laser-induced deposition of thin films are described. Many examples of photolytic and pyrolytic deposition of insulating, conducting and semiconducting materials, from either gas or liquid phase are given.
Author Micheli, F.
Boyd, I.W.
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CitedBy_id crossref_primary_10_3724_j_issn_1000_0518_1996_2_1821
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Issue 1
Keywords lasers
opto-electronic devices
laser deposition
laser processing
thin films
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Snippet In this paper, the second of a series of three reviewing the subject of laser microchemical processing — a potentially powerful technique for the fabrication...
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SubjectTerms laser deposition
laser processing
lasers
opto-electronic devices
thin films
Title Laser microfabrication of thin films: Part two
URI https://dx.doi.org/10.1016/0030-3992(87)90006-5
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