Laser microfabrication of thin films: Part two

In this paper, the second of a series of three reviewing the subject of laser microchemical processing — a potentially powerful technique for the fabrication of a variety of micro and opto-electronics devices — the main mechanisms of laser-induced deposition of thin films are described. Many example...

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Bibliographic Details
Published inOptics and laser technology Vol. 19; no. 1; pp. 19 - 25
Main Authors Micheli, F., Boyd, I.W.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 1987
Subjects
laser deposition
laser processing
lasers
opto-electronic devices
thin films
lasers
opto-electronic devices
laser deposition
laser processing
thin films
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ISSN0030-3992
1879-2545
DOI10.1016/0030-3992(87)90006-5

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Summary:In this paper, the second of a series of three reviewing the subject of laser microchemical processing — a potentially powerful technique for the fabrication of a variety of micro and opto-electronics devices — the main mechanisms of laser-induced deposition of thin films are described. Many examples of photolytic and pyrolytic deposition of insulating, conducting and semiconducting materials, from either gas or liquid phase are given.
ISSN:0030-3992
1879-2545
DOI:10.1016/0030-3992(87)90006-5