Photoresist spin coating mechanism related to polymer solution rheology

This study examines the influence of the macromolecular characteristics on the PMMA spin coating both experimentally and from a phenomenological point of view. It is concluded that the weight average molecular weight of the spun on solution is a pertinent paremeter, and that chain entanglements in p...

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Bibliographic Details
Published inMicroelectronic engineering Vol. 6; no. 1; pp. 427 - 431
Main Authors Weill, Andre, Francou, Jean Marc, Dechenaux, Elisabeth
Format Journal Article
LanguageEnglish
Published Elsevier B.V 1987
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Summary:This study examines the influence of the macromolecular characteristics on the PMMA spin coating both experimentally and from a phenomenological point of view. It is concluded that the weight average molecular weight of the spun on solution is a pertinent paremeter, and that chain entanglements in polymer solutions may be considered as the basic phenomenon responsible for the formation of the solid polymer layer.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(87)90069-4