In-Situ Nitrogen Doping of the TiO2 Photocatalyst Deposited by PEALD for Visible Light Activity
In this paper, an N-doped titanium oxide （TiO2） photocatalyst is deposited by a plasma-enhanced atomic layer deposition （PEALD） system through the in-situ doping method. X-ray photoelectron spectroscopy （XPS） analysis indicates that substitutional nitrogen atoms （-395.9 eV） with 1 atom% are effectiv...
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| Published in | 等离子体科学与技术：英文版 no. 3; pp. 239 - 243 |
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| Main Author | |
| Format | Journal Article |
| Language | English |
| Published |
2014
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| Subjects | |
| Online Access | Get full text |
| ISSN | 1009-0630 |
| DOI | 10.1088/1009-0630/16/3/12 |
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| Abstract | In this paper, an N-doped titanium oxide （TiO2） photocatalyst is deposited by a plasma-enhanced atomic layer deposition （PEALD） system through the in-situ doping method. X-ray photoelectron spectroscopy （XPS） analysis indicates that substitutional nitrogen atoms （-395.9 eV） with 1 atom% are effectively doped into TiO2 films. UV-VIS spectrometry shows that the in-situ nitrogen doping method indeed enhances the visible-activity of TiO2 films in the 425-550 nm range, and the results of the performance tests of the N-doped TiO2 films also imply that the photocatalysis activity is improved by in-situ doping. The in-situ doping mechanism of the N-doped TiO2 film is suggested according to the XPS results and the typical atomic layer deposition process. |
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| AbstractList | In this paper, an N-doped titanium oxide （TiO2） photocatalyst is deposited by a plasma-enhanced atomic layer deposition （PEALD） system through the in-situ doping method. X-ray photoelectron spectroscopy （XPS） analysis indicates that substitutional nitrogen atoms （-395.9 eV） with 1 atom% are effectively doped into TiO2 films. UV-VIS spectrometry shows that the in-situ nitrogen doping method indeed enhances the visible-activity of TiO2 films in the 425-550 nm range, and the results of the performance tests of the N-doped TiO2 films also imply that the photocatalysis activity is improved by in-situ doping. The in-situ doping mechanism of the N-doped TiO2 film is suggested according to the XPS results and the typical atomic layer deposition process. |
| Author | 饶志鹏 万军 李超波 陈波 刘键 黄成强 夏洋 |
| AuthorAffiliation | Key Laboratory of Microelectronics Devices ＆ Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China Jiaxing Research and Commercialization Center for Microelectronics Equipment, Jiaxing 314006, China Jiaxing Kemin Electronic Equipment ＆ Technologies CO., LTD, Jiaxing 314006, China |
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| DocumentTitleAlternate | In-Situ Nitrogen Doping of the TiO2 Photocatalyst Deposited by PEALD for Visible Light Activity |
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| Notes | plasma-enhanced atomic layer deposition, in-situ, nitrogen plasma, N-dopedTiO2, photocatalyst RAO Zhipeng,WAN Jun,LI Chaobo,CHEN Bo , LIU Jian , HUANG Chengqiang , XIA Yang（1Key Laboratory of Microelectronics Devices＆ Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China 2Jiaxing Research and Commercialization Center for Microelectronics Equipment, Jiaxing 314006, China 3Jiaxing Kemin Electronic Equipment ＆ Technologies CO., LTD, Jiaxing 314006, China） In this paper, an N-doped titanium oxide （TiO2） photocatalyst is deposited by a plasma-enhanced atomic layer deposition （PEALD） system through the in-situ doping method. X-ray photoelectron spectroscopy （XPS） analysis indicates that substitutional nitrogen atoms （-395.9 eV） with 1 atom% are effectively doped into TiO2 films. UV-VIS spectrometry shows that the in-situ nitrogen doping method indeed enhances the visible-activity of TiO2 films in the 425-550 nm range, and the results of the performance tests of the N-doped TiO2 films also imply that the photocatalysis activity is improved by in-situ doping. The in-situ doping mechanism of the N-doped TiO2 film is suggested according to the XPS results and the typical atomic layer deposition process. 34-1187/TL |
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| PublicationTitle | 等离子体科学与技术：英文版 |
| PublicationTitleAlternate | Plasma Science ＆ Technology |
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| Snippet | In this paper, an N-doped titanium oxide （TiO2） photocatalyst is deposited by a plasma-enhanced atomic layer deposition （PEALD） system through the in-situ... |
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| StartPage | 239 |
| SubjectTerms | TiO2光催化剂 TiO2薄膜 XPS分析 X射线光电子能谱 光催化活性 原位掺杂 原子层沉积 氮掺杂 |
| Title | In-Situ Nitrogen Doping of the TiO2 Photocatalyst Deposited by PEALD for Visible Light Activity |
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