Nanoscale mechanical patterning for the selective deposition of nanostructures
In this paper, we describe a new method for creating nanostructures, and demonstrate its use by depositing Au, Ni, and Zn on a SiO2 passivated Si substrate. The method combined the spatial control of electron-beam lithography with the ease of fabrication of self-assembled arrays. The technique enabl...
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Published in | Journal of materials research Vol. 15; no. 12; pp. 2684 - 2689 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
New York, USA
Cambridge University Press
01.12.2000
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Online Access | Get full text |
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Summary: | In this paper, we describe a new method for creating nanostructures, and demonstrate its use by depositing Au, Ni, and Zn on a SiO2 passivated Si substrate. The method combined the spatial control of electron-beam lithography with the ease of fabrication of self-assembled arrays. The technique enabled the selective electrochemical deposition of nanostructures by creating specific nucleation sites by nanoindentation. This offered the possibility of accurately creating nanostructures ranging in size from one to hundreds of nanometers. We showed that it is possible to electrically isolate the nanostructures from the substrate and each other by a thermal oxidation process. In principle, this technique allowed fabrication of quantum devices of any geometry. |
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Bibliography: | ark:/67375/6GQ-TQKS50J2-Z istex:4A1D23382F4FCF9A05D2D724957E1ACDD0E3AA3E PII:S0884291400056995 ArticleID:05699 ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0884-2914 2044-5326 |
DOI: | 10.1557/JMR.2000.0386 |